SBIR Phase I: Large nanostructured changes in refractive index in any 3D geometry

SBIR 第一阶段：任何 3D 几何形状中折射率的纳米结构大变化

• 批准号: 2051956
• 负责人: Daniel Oran
• 金额: $ 25.57万
• 依托单位: Irradiant Technologies Inc.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2021
• 资助国家: 美国
• 起止时间: 2021-06-01 至 2022-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2051956&HistoricalAwards=false
• 关键词: SBIR; Phase; Large; nanostructured; changes

The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase I project will be to enable an alternative to traditional nanofabrication which relies on structuring material in two-dimensional layers. These processes often limit the current design-space and prototyping/manufacturing methods with not only what can be made, but also the time and resources required for development, relegating viable commercial applications to only high-volume markets. These shortcomings will be addressed by developing a new form of nanofabrication 3D-printing capable of rapid-prototyping and mass-manufacturing photonic components with cheaper systems enabling the mass-customization of components that can more rapidly address market needs in both low- and high-volume markets. Products developed using this nanofabrication process for photonics components may address inefficiencies in datacenters with low-loss optical interconnects, as well as enabling complex optical filters, near-eye displays, and ultracompact lenses.This Small Business Innovation Research (SBIR) Phase I project develops a nanofabrication process for optical and photonic components to be fabricated with large changes in refractive index at nanoscale resolutions into any 3D geometry with graded control. The process uses volumetric deposition of nanomaterials consisting of high refractive index dielectrics into a patterned polyelectrolyte gel scaffold which, once shrunken, improves both resolution and density of the patterned materials. By utilizing two-photon lithography and linear shrink factors the process can achieve feature sizes below 25nm while allowing for the creation of gradient patterns in any 3D geometry. Combining this patterning and shrink strategy with a method to volumetrically deposit high refractive index dielectric nanomaterials will allow for a degree of control over refractive index never before possible; allowing light to be sculpted in 3D with unprecedented control.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

这项小型企业创新研究（SBIR）I阶段项目的更广泛的影响/商业潜力将是实现传统纳米制造的替代方案，该纳米制造依赖于二维层的结构材料。这些过程通常会限制当前的设计空间和原型制造/制造方法，不仅可以制造什么，而且还限制了开发所需的时间和资源，仅将可行的商业应用降级到只有大容量的市场。这些缺点将通过开发一种新形式的纳米制造3D印刷形式，能够使用便宜的系统进行快速投资和质量制造的光子组件，从而使组件的质量定位能够更快地解决低征和高压市场的市场需求。使用这种光子学组件的纳米制动过程开发的产品可能会解决具有低损坏光学互连的数据中心效率低下，并启用了复杂的光学滤镜，近眼显示和超级兼容镜头。纳米级分辨率的索引分为任何3D几何形状，并具有分级对照。该过程使用由高折射率介电介质组成的纳米材料的体积沉积到成立的聚电解质凝胶支架中，该凝胶支架曾经缩水，可以改善图案化材料的分辨率和密度。通过利用两光谱光刻和线性收缩因子，该过程可以达到低于25nm的特征大小，同时允许在任何3D几何形状中创建梯度模式。将这种模式和收缩策略与一种体积沉积高折射率介电纳米材料的方法相结合，将允许对折射率的一定程度的控制。该奖项反映了NSF的法定任务，并被认为是值得通过基金会的知识分子优点和更广泛的审查标准来评估的，因此允许在3D中雕刻光。