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IUCRC Phase II Boise State University: Center for Atomically Thin Multifunctional Coatings (ATOMIC)

IUCRC Phase II Boise State University: Center for Atomically Thin Multifunctional Coatings (ATOMIC)
IUCRC 第二阶段博伊西州立大学:原子薄多功能涂层中心 (ATOMIC)
批准号:
2113873
负责人:
David Estrada
金额:
$45.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2021
资助国家:
美国
项目状态:
未结题
起止时间:
2021-08-01 至 2026-07-31
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中文摘要
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英文摘要
The Center for Atomically Thin Multifunctional Coatings (ATOMIC) investigates the fundamental science of 2-dimensional (2D) material systems to enable a wide range of industrial and defense related applications. Phase II of the ATOMIC IUCRC adds a new site to the ATOMIC Center at Boise State University, thus extending the geographical reach of ATOMIC into the Pacific Northwest. A large focus of the work at the Boise State site is related to the fundamental chemistry needed to accelerate industry-scale synthesis of 2D materials via atomic layer deposition and large volume synthesis of 2D material inks for additive electronics manufacturing via inkjet, aerosol jet, plasma jet, and micro dispense/extrusion-based printing. The partnerships between ATOMIC universities, the industry members, and government partners are designed to serve the national interest by promoting the progress of 2D materials in science and engineering. Undergraduate and graduate students will have the opportunity to engage in research projects across all three sites, interacting with a diverse range of faculty and industry partners. Phase II builds on the robust foundation of scientific innovation in 2D materials at Penn State and Rice University and expands it into scalable 2D materials printing enabled by the addition of Boise State University. Penn State and Rice have successfully pioneered fundamental research programs in novel 2D materials, such as graphene, hBN, MoS2, and WS2; and Boise State has excelled in the area of nanomaterial ink development and controlled precision printing such as inkjet, plasma jet, aerosol jet, and micro-dispensing. This combination of expertise will ensure relevant pre-competitive research of interest to the industrial members in areas related to large-scale production processes, electronics, sensing, energy, and protection. The joint research efforts chosen and designed by ATOMIC will concentrate on addressing key societal and industrial problems in areas of U.S. national interest that can be mitigated through advanced multifunctional coatings, such as infrastructure protection, internet of things (IoT) sensing, electronics, energy harvesting/storage, autonomous systems, and biological threat reduction. Student-centric activities include transformational and applied research, developing intellectual property, low-cost nano-manufacturing and industry internship opportunities.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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会议论文
Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films
二硫化钼薄膜的本征和原子层蚀刻增强区域选择性原子层沉积
DOI: 10.1116/6.0002811
发表时间: 2023
期刊: Journal of Vacuum Science & Technology A
影响因子: 2.9
作者: [Soares, Jake, Jen, Wesley, Hues, John D., Lysne, Drew, Wensel, Jesse, Hues, Steven M., Graugnard, Elton]
通讯作者: Graugnard, Elton
FuSe-TG: A Co-Design Model for Advanced Manufacturing and Workforce Development to Enhance Future Semiconductor Technologies
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    2235294
  • 项目类别:
    Standard Grant
  • 资助金额:
    $40.0万
  • 财政年份:
    2023
  • 负责人:
    David Estrada
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  • 项目类别:
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  • 负责人:
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