IUCRC Phase II Boise State University: Center for Atomically Thin Multifunctional Coatings (ATOMIC)

IUCRC 第二阶段博伊西州立大学：原子薄多功能涂层中心 (ATOMIC)

• 批准号: 2113873
• 负责人: David Estrada
• 金额: $ 45万
• 依托单位: Boise State University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2021
• 资助国家: 美国
• 起止时间: 2021-08-01 至 2026-07-31
• 项目状态: 未结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2113873&HistoricalAwards=false
• 关键词: IUCRC; Phase; II; Boise; State

The Center for Atomically Thin Multifunctional Coatings (ATOMIC) investigates the fundamental science of 2-dimensional (2D) material systems to enable a wide range of industrial and defense related applications. Phase II of the ATOMIC IUCRC adds a new site to the ATOMIC Center at Boise State University, thus extending the geographical reach of ATOMIC into the Pacific Northwest. A large focus of the work at the Boise State site is related to the fundamental chemistry needed to accelerate industry-scale synthesis of 2D materials via atomic layer deposition and large volume synthesis of 2D material inks for additive electronics manufacturing via inkjet, aerosol jet, plasma jet, and micro dispense/extrusion-based printing. The partnerships between ATOMIC universities, the industry members, and government partners are designed to serve the national interest by promoting the progress of 2D materials in science and engineering. Undergraduate and graduate students will have the opportunity to engage in research projects across all three sites, interacting with a diverse range of faculty and industry partners. Phase II builds on the robust foundation of scientific innovation in 2D materials at Penn State and Rice University and expands it into scalable 2D materials printing enabled by the addition of Boise State University. Penn State and Rice have successfully pioneered fundamental research programs in novel 2D materials, such as graphene, hBN, MoS2, and WS2; and Boise State has excelled in the area of nanomaterial ink development and controlled precision printing such as inkjet, plasma jet, aerosol jet, and micro-dispensing. This combination of expertise will ensure relevant pre-competitive research of interest to the industrial members in areas related to large-scale production processes, electronics, sensing, energy, and protection. The joint research efforts chosen and designed by ATOMIC will concentrate on addressing key societal and industrial problems in areas of U.S. national interest that can be mitigated through advanced multifunctional coatings, such as infrastructure protection, internet of things (IoT) sensing, electronics, energy harvesting/storage, autonomous systems, and biological threat reduction. Student-centric activities include transformational and applied research, developing intellectual property, low-cost nano-manufacturing and industry internship opportunities.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

原子薄多功能涂层中心 (ATOMIC) 研究二维 (2D) 材料系统的基础科学，以实现广泛的工业和国防相关应用。 ATOMIC IUCRC 第二阶段在博伊西州立大学 ATOMIC 中心增加了一个新地点，从而将 ATOMIC 的地理范围扩展到太平洋西北地区。博伊西州立大学工厂的工作重点涉及通过原子层沉积加速工业规模合成 2D 材料所需的基础化学，以及通过喷墨、气溶胶喷射、等离子喷射和基于微分配/挤出的印刷进行增材电子制造的 2D 材料墨水的大批量合成。 ATOMIC 大学、行业成员和政府合作伙伴之间的合作伙伴关系旨在通过促进二维材料在科学和工程领域的进步来服务于国家利益。 本科生和研究生将有机会参与所有三个地点的研究项目，与各种教师和行业合作伙伴互动。第二阶段建立在宾夕法尼亚州立大学和莱斯大学的二维材料科学创新的坚实基础上，并通过博伊西州立大学的加入将其扩展到可扩展的二维材料打印。宾夕法尼亚州立大学和莱斯大学已成功开创了石墨烯、六方氮化硼、MoS2 和 WS2 等新型二维材料的基础研究项目；博伊西州立大学在纳米材料墨水开发和喷墨、等离子喷射、气溶胶喷射和微点胶等受控精密印刷领域表现出色。这种专业知识的结合将确保工业成员在大规模生产工艺、电子、传感、能源和保护相关领域进行感兴趣的相关竞争前研究。 ATOMIC 选择和设计的联合研究工作将集中于解决美国国家利益领域的关键社会和工业问题，这些问题可以通过先进的多功能涂层来缓解，例如基础设施保护、物联网 (IoT) 传感、电子、能量收集/存储、自主系统和减少生物威胁。以学生为中心的活动包括转型和应用研究、开发知识产权、低成本纳米制造和行业实习机会。该奖项反映了 NSF 的法定使命，并通过使用基金会的智力优势和更广泛的影响审查标准进行评估，被认为值得支持。

项目成果

Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films

二硫化钼薄膜的本征和原子层蚀刻增强区域选择性原子层沉积

• DOI: 10.1116/6.0002811
• 发表时间: 2023
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: Soares, Jake;Jen, Wesley;Hues, John D.;Lysne, Drew;Wensel, Jesse;Hues, Steven M.;Graugnard, Elton
• 通讯作者: Graugnard, Elton