MRI: Acquisition of an Electron Beam Lithography System for Quantum Engineering and Nanoscience Research, Education and Training

MRI：采购用于量子工程和纳米科学研究、教育和培训的电子束光刻系统

• 批准号: 2215550
• 负责人: Juliet Gopinath
• 金额: $ 137.9万
• 依托单位: University of Colorado at Boulder
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2022
• 资助国家: 美国
• 起止时间: 2022-09-01 至 2025-08-31
• 项目状态: 未结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2215550&HistoricalAwards=false
• 关键词: MRI; Acquisition; Electron; Beam; Lithography

Abstract TitleThe acquisition of a state-of-the-art electron beam lithography system that will enable high resolution patterning of materials and devices.AbstractThe capability of high-resolution patterning a wide range of materials into nanostructures is a fundamental requirement for almost all solid-state materials and device research. This has been instrumental in key technological advancements including high-performance classical and quantum computing, photonic communications, chip-scale optical frequency combs, integrated sensors, energy harvesting, and flexible electronics. Future breakthroughs will lead to long-distance quantum networks, fault-tolerant quantum computers, miniature chip-scale optical clocks, new materials for thermal transport, personalized medicine, and nanosensors for force, position and navigation. The proposed acquisition of a state-of-the-art electron beam lithography (EBL) system at University of Colorado Boulder will provide the required nanofabrication capabilities. It will greatly enhance scientific research and education for a broad array of researchers and students, including under-represented groups, in the Rocky Mountain Region, as well as nationwide. This will help to address the national need for expertise in the semiconductor and quantum industries. The EBL’s unique capabilities have attracted over 64 research programs, with strong interest in an electron beam lithography system at University of Colorado Boulder. The system will provide the region’s only state-of-the-art 100 kV electron beam writer in an open access shared user facility. The goal of the project is the acquisition of a state-of-the-art electron beam lithography system at the University of Colorado Boulder that will enable nanofabrication capabilities in terms of high pattern resolution, large field of view, low stitching/overlay errors and features with low side-wall roughness. Research on solid-state nano-scale devices requires the ability to produce complex, high-quality patterns on functional materials. For further progress, fabrication techniques that yield nanometer-scale resolution, low roughness, and high quality devices are critical. Electron beam lithography, with its wide applicability to a vast array of materials, nanometer-scale resolution, and ability to produce high quality devices is well-suited to the next generation of devices that will form the backbone of nano-, photonic, quantum and electronic technology. The system will spark a wide array of nanoscience and quantum engineering research, transforming materials and device research in the Rocky Mountain region and on a national scale. The proposed EBL system will greatly enhance regional and national research and collaboration in the areas of quantum technologies, photonics, sensing and metrology, bioengineering, and energy, providing fabrication capabilities currently unavailable to most researchers and students in the Rocky Mountain Region. It will be a cornerstone for the research at the University of Colorado Boulder, as well as for the broader research community and industry in the Rocky Mountain Region and across the United States.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

Abstract TitleThe收购的一个国家的最先进的电子束光刻系统，将使高分辨率图案化的材料和devices.AbstractThe高分辨率图案化的能力，广泛的材料到纳米结构是一个基本要求，几乎所有的固态材料和器件的研究。这有助于关键技术的进步，包括高性能经典和量子计算、光子通信、芯片级光频梳、集成传感器、能量收集和柔性电子器件。未来的突破将导致长距离量子网络，容错量子计算机，微型芯片级光学时钟，用于热传输的新材料，个性化医疗以及用于力，位置和导航的纳米传感器。拟议收购的最先进的电子束光刻（EBL）系统在科罗拉多大学博尔德将提供所需的纳米加工能力。 它将大大加强科学研究和教育的广泛的研究人员和学生，包括代表性不足的群体，在落基山脉地区，以及全国范围内。这将有助于满足国家对半导体和量子行业专业知识的需求。EBL的独特能力吸引了超过64个研究项目，其中科罗拉多大学博尔德分校的电子束光刻系统引起了浓厚的兴趣。 该系统将提供该地区唯一的最先进的100千伏电子束写入器在一个开放的访问共享用户设施。 该项目的目标是在科罗拉多大学博尔德分校获得最先进的电子束光刻系统，该系统将在高图案分辨率、大视场、低拼接/重叠误差和低侧壁粗糙度特征方面实现纳米加工能力。 固态纳米级器件的研究需要在功能材料上制作复杂、高质量图案的能力。为了取得进一步的进展，生产纳米级分辨率，低粗糙度和高质量器件的制造技术是至关重要的。电子束光刻技术具有对大量材料的广泛适用性、纳米级分辨率以及生产高质量器件的能力，非常适合下一代器件，这些器件将成为纳米、光子、量子和电子技术的支柱。该系统将引发广泛的纳米科学和量子工程研究，改变落基山脉地区和全国范围内的材料和设备研究。 拟议的EBL系统将大大加强量子技术、光子学、传感和计量学、生物工程和能源领域的区域和国家研究与合作，为落基山脉地区的大多数研究人员和学生提供目前无法提供的制造能力。该奖项将成为科罗拉多大学博尔德分校以及落基山脉地区和整个美国更广泛的研究社区和行业的基石。该奖项反映了NSF的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。