Adaptive aberration compensation in high refractive index materials for next-generation active microphotonic devices

用于下一代有源微光子器件的高折射率材料的自适应像差补偿

• 批准号: LX0881913
• 负责人: Prof Min Gu
• 金额: $ 2.84万
• 依托单位: Swinburne University of Technology
• 依托单位国家: 澳大利亚
• 项目类别: Linkage - International
• 财政年份: 2008
• 资助国家: 澳大利亚
• 起止时间: 2008-01-01 至 2011-12-31
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/LX0881913
• 关键词: Adaptive; aberration; compensation; refractive; index

The method proposed in this project is a very promising and versatile method to compensate the strong aberration in a high refractive index material. The successful compensation of such aberration will allow people to fabricate microdevices directly inside high refractive index materials. This project will greatly advance optical fabrication techniques and expand the national knowledge in the area of nonlinear PhCs (photonic crystals) and related applications. It is expected that the project will provide many chances for postgraduate students to be involved. In future, nonlinear PhCs and related devices may be widely used in daily life and this project may provide some opportunities for industry.

本计画所提出的方法对于补偿高折射率材料中的强像差是一种非常有前景且通用的方法。这种像差的成功补偿将使人们能够直接在高折射率材料中制造微器件。该项目将极大地推进光学制造技术，并扩大非线性光子晶体（光子晶体）和相关应用领域的国家知识。预计该项目将为研究生提供更多参与的机会。在未来，非线性光子晶体及其相关器件可能会广泛应用于日常生活中，本项目可能会为工业提供一些机会。