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Adaptive aberration compensation in high refractive index materials for next-generation active microphotonic devices

Adaptive aberration compensation in high refractive index materials for next-generation active microphotonic devices
用于下一代有源微光子器件的高折射率材料的自适应像差补偿
批准号:
LX0881913
负责人:
Prof Min Gu
金额:
$2.84万
依托单位国家:
澳大利亚
项目类别:
Linkage - International
财政年份:
2008
资助国家:
澳大利亚
项目状态:
已结题
起止时间:
2008-01-01 至 2011-12-31

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中文摘要
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英文摘要
The method proposed in this project is a very promising and versatile method to compensate the strong aberration in a high refractive index material. The successful compensation of such aberration will allow people to fabricate microdevices directly inside high refractive index materials. This project will greatly advance optical fabrication techniques and expand the national knowledge in the area of nonlinear PhCs (photonic crystals) and related applications. It is expected that the project will provide many chances for postgraduate students to be involved. In future, nonlinear PhCs and related devices may be widely used in daily life and this project may provide some opportunities for industry.
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