SBIR Phase II: Novel Manufacturing Method for Precision Optical Encoders

这个小型企业创新研究(SBIR)第二阶段项目旨在开发一种新的制造方法来生产高精度的光学编码器。编码器是一种传感器，可以测量位置，无论是线性的还是角度的，并将其转换为电子信号。现代自动化和机器人系统在很大程度上依赖编码器进行精确定位和运动控制。预计到2028年，全球编码器市场将从2022年的24亿美元增长到44亿美元。需要越来越精确的编码器来进一步创新和制造复杂的下一代产品，如先进的微芯片、植入式医疗设备和精密武器系统。随着设计规范变得越来越严格，满足高精度编码器的需求变得至关重要。该项目的成功完成将建立一种试验能力，以具有成本效益的方式生产基本分辨率超过数量级的编码器。该项目的智力优势集中在开发一种有可能彻底改变光学编码器制造的技术。传统的编码器生产涉及使用接触式光刻来复制来自主光掩模的图案。然而，这一过程需要全尺寸的光掩模，在器件中引入缺陷和误差，并限制了可实现的精度和分辨率。为了解决这些缺点，正在开发一种新颖的、高分辨率的投影光刻系统来驱动附加微制造技术。这种新方法提供了许多优势，包括经济上可行的亚纳米分辨率精密编码器的生产、更高的制造产量和更短的交货期。第二阶段的研究活动包括开发全尺寸硬件原型，其性能可追溯到NIST(国家标准与技术研究所)标准，以及建立必要的基础设施来支持新开发的技术。该奖项反映了NSF的法定使命，并通过使用基金会的智力优势和更广泛的影响审查标准进行评估，被认为值得支持。

This Small Business Innovation Research (SBIR) Phase II project aims to develop a novel manufacturing method to produce high-accuracy, optical encoders. Encoders are sensors that measure position, either linear or angular, and convert it into an electronic signal. Modern automation and robotics systems heavily rely on encoders for precision positioning and motion control. The global encoder market is projected to reach $4.4 billion by 2028, growing from $2.4 billion in 2022. Increasingly accurate encoders are needed to further innovate and enable the manufacturing of complex next-generation products, such as advanced microchips, implantable medical devices, and precision weapon systems. As design specifications become more stringent, the need to meet the demand for high-precision encoders becomes paramount. Successful completion of the project will establish a pilot capability to cost-effectively produce encoders with over an order of magnitude finer fundamental resolution.The intellectual merit of this project is focused on developing a technology that has the potential to revolutionize the manufacturing of optical encoders. Traditional encoder production involves using contact photolithography to replicate a pattern from a master photomask. However, this process requires a full-size photomask, introduces defects and errors into the device, and limits the achievable accuracy and resolution. To address these drawbacks, a novel, high-resolution, projection lithography system is being developed to drive an additive micro-fabrication technique. The new approach offers numerous advantages, including economically viable production of precision encoders with sub-nanometer resolution, improved manufacturing yield, and shorter lead times. The Phase II research activities encompass the development of a full-size hardware prototype with performance traceable to NIST (National Institute of Standards and Technology) standards, as well as the establishment of the necessary infrastructure to support the newly developed technology.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.