Detection and coherent control of electron spins at the nano-scale

纳米尺度电子自旋的检测和相干控制

• 批准号: 274372794
• 负责人: Professor Dr. Wolfgang Harneit
• 金额: --
• 依托单位: Arbeitsgruppe Quantenspintronik
• 依托单位国家: 德国
• 项目类别: Heisenberg Professorships
• 财政年份: 2015
• 资助国家: 德国
• 起止时间: 2014-12-31 至 2019-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/274372794?language=en
• 关键词: Detection; coherent; control; electron; spins

The precondition for a Heisenberg Programme funding is high scientific quality and originality of the research project at international level and suitability for further qualification as a university teacher. Applicants need to meet all the requirements for appointment to a permanent professorship.The aim of this programme is to enable outstanding scientists to prepare for a scientific leadership function, and simultaneously work on further research topics. This research does not necessarily need to be planned and carried out in the form of a project.For this reason, and unlike the procedure in other funding programmes, both the abstracts of applications and final reports are not required and will therefore not be published in GEPRIS.

海森堡计划资助的先决条件是高科学质量和国际水平的研究项目的原创性，并适合作为大学教师的进一步资格。申请人需要满足任命为永久教授的所有要求。该计划的目的是使杰出的科学家为科学领导职能做好准备，同时从事进一步的研究课题。这项研究并不一定需要以项目形式规划和进行，因此，与其他资助计划的程序不同，申请摘要和最后报告都不需要，因此不会在GEPRIS上发表。

项目成果

Capillary Nanostamping with Spongy Mesoporous Silica Stamps

• DOI: 10.1002/adfm.201800700
• 发表时间: 2018-03
• 期刊: Advanced Functional Materials
• 影响因子: 19
• 作者: Mercedes Schmidt;Michael Philippi;Maximilian Münzner;J. Stangl;Ren'e Wieczorek;W. Harneit;K. Müller‐Buschbaum;D. Enke;M. Steinhart

Stability of C60 and N@C60 under thermal and optical exposure

• DOI: 10.1016/j.carbon.2015.08.073
• 发表时间: 2015-12-01
• 期刊: CARBON
• 影响因子: 10.9
• 作者: Eckardt, Michael;Wieczorek, Rene;Harneit, Wolfgang
• 通讯作者: Harneit, Wolfgang

Capillary Stamping of Functional Materials: Parallel Additive Substrate Patterning without Ink Depletion

功能材料的毛细管冲压：无墨水耗尽的并行增材基板图案化

• DOI: 10.1002/admi.202001911
• 发表时间: 2021
• 期刊: Advanced Materials Interfaces
• 影响因子: 5.4
• 作者: M. Runge;H. Hübner;A. Grimm;G. Manoharan;R. Wieczorek;M. Philippi;W. Harneit;C. Meyer;D. Enke;M. Gallei;M. Steinhart
• 通讯作者: M. Steinhart