New and Novel Superhard Coatings Prepared by Electron-Cyclotron-Resonance Plasma-Enhanced Chemical Vapour Deposition

寻找具有新颖性能的新型超硬材料，不仅对于了解这些材料的科学技术，而且对于评估其应用的全部潜力都是重要的。作为共价键的结果，硼(B)、硅(Si)、碳(C)、氮(N)和/或氧(O)四种元素可以形成超硬材料。在过去的十年里，很多工作都集中在二进制和三元组分上。初步研究认为，Si？B？C？N四元系有望在极端制备条件下利用先进的技术创造新型超硬材料。在这一方案中，继过去几年成功地合成了金刚石、立方氮化硼薄膜和纳米结构超硬金刚石/？-碳化硅复合膜之后，我们尝试用电子回旋共振微波等离子体化学气相沉积(ECRMWCVD)方法从Si-B-C-N-(O)系合成新型超硬涂层。对新材料的生长机理、碳、氮、氢、氧的作用、薄膜的晶体结构和性能进行了系统的研究。

The search for new superhard materials with novel properties is important not only for an understanding of the science and technology of these materials but also for evaluating the full potential of their applications. As a result of covalent bonding, the four elements boron (B), silicon (Si), carbon (C), nitrogen (N) and/or probably oxygen (O) can form superhard materials. In the last decade, much effort has concentrated on binary and ternary components. The preliminary investigations lead one to believe that the Si¿B¿C¿N quanternary system may give opportunity to the creation of new type of superhard materials by using the advanced technique operating at the extreme preparation conditions.In this proposal, following the successful synthesis of diamond, cBN thin films and nanostrutured superhard diamond/ß-SiC composite films in the past few years, we make an attempt to synthesize new type of superhard coatings from the Si-B-C-N-(O) system by electron-cyclotron-resonance microwave plasma assisted chemical vapour deposition (ECRMWCVD). The growth mechanism of the new material, the role of carbon, nitrogen, hydrogen and oxygen, the crystal structure as well as the properties of the deposited films will be investigated systematically.