New and Novel Superhard Coatings Prepared by Electron-Cyclotron-Resonance Plasma-Enhanced Chemical Vapour Deposition

寻找具有新性能的新型超硬材料不仅对理解这些材料的科学和技术，而且对评估其应用的全部潜力都很重要。由于共价键作用，硼(B)、硅（Si）、碳(C)、氮(N)和/或氧(O)这四种元素可以形成超硬材料。在过去的十年中，很多工作都集中在二元和三元组件上。初步的研究使人们相信，Si¿B¿C¿N四元体系可以通过在极端制备条件下操作的先进技术来创造新型超硬材料。本课题继近年来金刚石、cBN薄膜和纳米结构超硬金刚石/ß-SiC复合薄膜的成功合成之后，尝试采用电子-旋波共振微波等离子体辅助化学气相沉积（ECRMWCVD）技术从Si-B-C-N-(O)体系合成新型超硬涂层。对新材料的生长机理、碳、氮、氢和氧的作用、晶体结构和沉积膜的性能进行了系统的研究。

The search for new superhard materials with novel properties is important not only for an understanding of the science and technology of these materials but also for evaluating the full potential of their applications. As a result of covalent bonding, the four elements boron (B), silicon (Si), carbon (C), nitrogen (N) and/or probably oxygen (O) can form superhard materials. In the last decade, much effort has concentrated on binary and ternary components. The preliminary investigations lead one to believe that the Si¿B¿C¿N quanternary system may give opportunity to the creation of new type of superhard materials by using the advanced technique operating at the extreme preparation conditions.In this proposal, following the successful synthesis of diamond, cBN thin films and nanostrutured superhard diamond/ß-SiC composite films in the past few years, we make an attempt to synthesize new type of superhard coatings from the Si-B-C-N-(O) system by electron-cyclotron-resonance microwave plasma assisted chemical vapour deposition (ECRMWCVD). The growth mechanism of the new material, the role of carbon, nitrogen, hydrogen and oxygen, the crystal structure as well as the properties of the deposited films will be investigated systematically.