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Optical properties of porous Sb-based semiconductors prepared by swift heavy-ion irradiation

Optical properties of porous Sb-based semiconductors prepared by swift heavy-ion irradiation
快速重离子辐照制备多孔锑基半导体的光学性质
批准号:
315061093
负责人:
Dr. Christian Notthoff
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Fellowships
财政年份:
2016
资助国家:
德国
项目状态:
已结题
起止时间:
2015-12-31 至 2017-12-31

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中文摘要
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英文摘要
Porous semiconductors differ significantly in their physical and chemical properties from their bulk counterparts, due to their microstructure. Porous silicon, for example, shows an intense, spectrally tunable luminescence while no optical activity is observed for bulk silicon. The controlled fabrication of porous semiconductors opens up the possibility to develop new materials and allows an optimization of their application specific properties (e.g., for optoelectronic devices). It is essential to obtain an in-depth understanding of the influence of the microstructure on the physical and chemical properties and to develop process technologies which allow the controlled preparation of porous semiconductors. Recently, Patrick Kluth et al. (Australian National University) discovered a process by which swift heavy ions generate fascinating porous structures in Galliumantimonide (GaSb) and Indiumantimonide (InSb). The method is very efficient, easy to control and compatible with current manufacturing processes. However, there are hardly any studies on the optical properties of porous, antimony based semiconductors. Thus, we propose to investigate the influence of the microstructure on the optical properties of porous GaSb and InSb within this research project. For an in-depth understanding of the underlying mechanisms, a detailed knowledge about the microstructure is needed in addition to optical characterization (by photoluminescence and Raman spectroscopy). The information about the microstructure will be obtained by a combination of imaging scanning electron microscopy and X-ray small angle scattering.
期刊论文(3)
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会议论文
Conical etched ion tracks in SiO2 characterised by small angle X-ray scattering
SiO2 中的锥形蚀刻离子轨迹以小角 X 射线散射为特征
DOI: 10.1016/j.nimb.2017.10.020
发表时间: 2018
期刊: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
影响因子: --
作者: [A. Hadley, C. Notthoff, P. Mota-Santiago, U.H. Hossain, S. Mudie, M.E. Toimil-Molares, C. Trautmann, P. Kluth]
通讯作者: P. Kluth
Etched ion tracks in amorphous SiO2 characterized by small angle x-ray scattering: influence of ion energy and etching conditions
以小角 X 射线散射为特征的非晶 SiO2 中的蚀刻离子轨迹:离子能量和蚀刻条件的影响
DOI: 10.1088/1361-6528/ab10c8
发表时间: 2019
期刊: Nanotechnology
影响因子: 3.5
作者: [Hadley, Notthoff, Mota-Santiago, Hossain, Toimil-Molares, Trautmann]
通讯作者: Trautmann
Structural properties of nano-porous GaSb prepared by swift heavy-ion irradiation
快重离子辐照制备纳米多孔GaSb的结构性质
DOI: 10.1016/j.nimb.2017.10.015
发表时间: 2018
期刊: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
影响因子: --
作者: [C. Notthoff, P. Mota-Santiago, A. Hadley, U.H. Hossain, S. Jordan, C. Glover, S. Mudie, P. Kluth]
通讯作者: P. Kluth
国内基金
海外基金
镍基UNS N10003合金辐照位错环演化机制及其对力学性能的影响研究
聚合铁-腐殖酸混凝沉淀-絮凝调质过程中絮体污泥微界面特性和群体流变学的研究
  • 批准号:
    20977008
  • 项目类别:
    面上项目
  • 资助金额:
    34.0万元
  • 批准年份:
    2009
  • 负责人:
    王毅力
  • 依托单位:
层状钴基氧化物热电材料的组织取向度与其性能关联规律研究
  • 批准号:
    50702003
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    20.0万元
  • 批准年份:
    2007
  • 负责人:
    路清梅
  • 依托单位: