Patterned organic molecular architecture by vacuum deposition

点击翻译按钮获取中文摘要

The ability to explore organic materials for device fabrication requires patterning the films in a controlled way. Unfortunately, photolithography with high resolution and high uniformity over large areas cannot simply be implemented for organic semiconductors (OSCs) owing to their fragility. Current patterning techniques for organic materials, e. g. shadow mask and printing still suffer to some extent from low resolution and poor scalability. A number of researchers have sought to pattern the OSCs with photolithography by sealing organic layers between metal layers or using fluorinated chemicals. However, the processes are still facing complicated multi-step procedures or high costs.The purpose of this project is to obtain patterned functional organic structures with mesoscopic resolution based on top-down directed bottom-up strategy. In particular, we aim at developing cross-talk free, high cut-off frequency organic field-effect transistors (OFETs) and their basic digital circuit blocks. We will focus on the following aspects: 1) Improving the carrier mobility of short channel OFETs by designing molecules and optimizing the crystallization process; 2) reducing organic/electrode contact resistance by surface/interface modifications; 3) AC and DC characterization of short channel OFETs and their basic digital circuit blocks.