Elucidation of mechanism on photo-induced electrical properties developing in narrow-bandgap ferroelectric material thin films

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Fabrication of narrow bandgap ferroelectric thin films was carried out by the chemical solution deposition process that chemical composition control was facile, and the elucidation of photo-induced electrical properties under the visible light irradiation was performed. The existence of the self-bias electric field in the film after the preparation was clarified by the behavior of the photo-induced electric current. In addition, photo-induced electrical properties were greatly influenced by bandgap and ferroelectric properties, the polarization direction could turn over the photo-induced current and photovoltage by poling treatment with applying an electric field more than a coercive field. For the further properties improvement, it was effective to prepare the composites with noble metal nanoparticles.