Fabrication of complete photonic band gap structures by two-photon polymerization and subsequent infiltration with high refractive index materials

点击翻译按钮获取中文摘要

The ability to shrink photonic circuits by orders of magnitudes by the integration of photonic crystals offers many stimulating possibilities for novel device designs. A speculative view is that this miniaturisation can have a similar impact to that experienced in electronic components in the 1960s. However, the fabrication of 3D photonic crystals remains a major challenge and the development of new, flexible, and fast nano-fabrication techniques is vital. The realization of an innovative technique for the fabrication of 3D complete photonic band gap structures as it is suggested will make an essential contribution to the emerging field of all-optical tele- and data-communications and will deliver major economic benefit to Australia.