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Basic properties of ternary group III nitride compound semiconductor non-polar surfaces

Basic properties of ternary group III nitride compound semiconductor non-polar surfaces
三元III族氮化物化合物半导体非极性表面的基本性质
批准号:
398305088
负责人:
Professor Dr. Mario Dähne, since 5/2021
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2018
资助国家:
德国
项目状态:
已结题
起止时间:
2017-12-31 至 2021-12-31

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中文摘要
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英文摘要
The development of novel semiconductor devices based on wurtzite structure group III nitrides cannot rely solely on the binary compounds, i.e. GaN, AlN, and InN, since only ternary (Al,Ga,In)N compounds offer the possibility to engineer the desired electronic/optoelectronic properties. In order to control device properties in a bottom-up fashion, a detailed microscopic and spectroscopic understanding of the fundamental properties and physics of the ternary group III nitrides semiconductor materials is necessary. A direct experimental access to these properties is, however, a rather difficult task, since only surface sensitive measurements can provide such microscopic and spectroscopic information with sufficient resolution and hence bulk properties are typically hidden by non-stoichiometric ad-layers on polar group III nitride surfaces. This can be avoided by investigating non-polar surfaces, which allow for probing both bulk and surface properties. In addition, they are technologically relevant for wurtzite structure nanowires. Therefore, we propose to investigate basic properties of ternary group III nitride compound semiconductor non-polar surfaces. The objectives are to determine (i) intrinsic surface states, their spatial localization and energy levels, as well as the surface band gaps, (ii) the physical origin of the Fermi-level pinning and (iii) of electron accumulation effects, (iv) the electron affinities for the different compounds, (v) the effect of lattice strain and (vi) of doping on the basic properties, (vii) a microscopic and spectroscopic investigation of the ternary alloys to determine clustering, fluctuations, ordering, as well as growth dependent effects, and finally (viii) the analysis of defects, such as threading dislocations, steps, interface misfit dislocations, and their extrinsic states. With such a comprehensive understanding the design of electronic/optoelectronic devices based on group III nitrides can be turned much more effective.
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国内基金
海外基金
镍基UNS N10003合金辐照位错环演化机制及其对力学性能的影响研究
聚合铁-腐殖酸混凝沉淀-絮凝调质过程中絮体污泥微界面特性和群体流变学的研究
  • 批准号:
    20977008
  • 项目类别:
    面上项目
  • 资助金额:
    34.0万元
  • 批准年份:
    2009
  • 负责人:
    王毅力
  • 依托单位:
层状钴基氧化物热电材料的组织取向度与其性能关联规律研究
  • 批准号:
    50702003
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    20.0万元
  • 批准年份:
    2007
  • 负责人:
    路清梅
  • 依托单位: