Resolution and throughput scalability limits of a compact EUV nanopatterning tool - Erkenntnistransfer-Projekt

紧凑型 EUV 纳米图案工具的分辨率和吞吐量可扩展性限制 - 知识转移项目

基本信息

项目摘要

The planned work is based on the DFG project "Realisation of artificial three-dimensional Ge-quantum dot crystals by extreme ultraviolet interference lithography and molecular-beam epitaxy". Therein developed experimental setup for laboratory-based nanostructuring with EUV radiation serves as the basis for the proposed knowledge transfer project. The setup currently allows patterning of periodic structures with a minimal half-pitch of 28 nm over large areas of several square millimeters. To the best of our knowledge this is the highest density pattern ever achieved with a laboratory interference lithography. This remarkable scientific achievement resulted in an industrial interest in this technology. The knowledge transfer in combination with the joint work program together with the industrial partner will enable further development of the patterning method and high-precision system technology. The aim is to realize minimal feature sizes of 10 nm half-pitch as requested by potential customers in preliminary enquiries. Achieving this goal is only possible by extensive work on the enhancement of the transmission mask technology, the stability and accuracy of the positioning system and the design of a highly effective illumination system.The joint work program will allow to determine the scientific and technical limits of the approach and to identify new application areas. Based on the results of the project the industrial partner will be qualified to fabricate a market-ready EUV nanopatterning tool.
计划的工作是基于DFG项目“通过极紫外干涉光刻和分子束外延实现人工三维ge量子点晶体”。在此基础上,建立了基于实验室的EUV辐射纳米结构实验装置,为提出的知识转移项目奠定了基础。目前,该装置允许在几平方毫米的大面积上以最小半间距28nm的周期性结构图案。据我们所知,这是实验室干涉光刻所获得的最高密度图案。这一非凡的科学成就引起了工业界对这项技术的兴趣。与工业合作伙伴的联合工作计划相结合的知识转移将使图案方法和高精度系统技术的进一步发展成为可能。目标是实现潜在客户在初步询价中所要求的10纳米半间距的最小特征尺寸。要实现这一目标,只有在增强传输掩模技术、定位系统的稳定性和准确性以及高效照明系统的设计方面进行广泛的工作。联合工作计划将允许确定该方法的科学和技术限制,并确定新的应用领域。根据该项目的结果,工业合作伙伴将有资格制造市场就绪的EUV纳米图案化工具。

项目成果

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Professor Dr. Carlo Holly, since 7/2021其他文献

Professor Dr. Carlo Holly, since 7/2021的其他文献

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{{ truncateString('Professor Dr. Carlo Holly, since 7/2021', 18)}}的其他基金

Spectroscopic EUV metrology for nanoscale gratings
纳米级光栅的光谱 EUV 计量
  • 批准号:
    415848294
  • 财政年份:
    2019
  • 资助金额:
    --
  • 项目类别:
    Research Grants

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    2011
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    60.0 万元
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