X-ray photoelectron spectroscopy system

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X-ray photoelectron spectroscopy (XPS) is a pivotal analytical method for the characterization of, e.g. the chemical composition or redox states of surfaces and molecular compounds. The requested system replaces an older machine, the breakdown of which could not be compensated by other resources in Göttingen. It will be utilized within numerous scientific projects for the characterization of heterogeneous und homogeneous catalysts and metal, metal chalcogenide and polymer films and heterostructures. The XPS system is necessary to strengthen several running collaborative research structures and individual projects and planned initiatives.Chemical characterization of the relevant samples requires a monochromatic X-ray source (Al) with high energy resolution (<1eV) and simultaneously high sensitivity of the detector. A second source is necessary for the examination of Al-containing samples. Depth profiling of soft materials (polymers, metal chalcogenides) shall be enabled by argon cluster sputtering. An electron source is required for the identification of Auger peaks. The XPS system will be run in multi-user mode to enable broad use by several groups and centralized maintenace. It is therefore planned to accommodate it in the joined campus-lab CLUE in the Department of Physics and offer access to a large group of users particularly from chemistry and physics.