X-ray Photoelectron Spectroscopy (XPS)

点击翻译按钮获取中文摘要

Surfaces, their structure and chemical composition, play a major role in implant development with regard to biocompatibility, in particular implant-tissue interaction. By means of X-ray photoelectron spectroscopy (XPS), layer analysis in the height range of few nanometers can be performed on conductive materials, as well as on non-conductive materials such as polymers. Ion beam etching also makes depth profile analysis accessible and allows for the investigation of surface degradation, corrosion as well as determination of laminations and for the analysis of diffusion effects between two layers. Thus it is possible to obtain not only the distribution of elements, but also characterize surface modifications for the development of innovative implant platforms, for example the differentiation and quantification of hydroxyl and carbonyl groups after treatment of a material with oxygen plasma. This is relevant as the types of functional groups determine the method and the yield of the binding of pharmaceutically active compounds, and also have a direct effect on biocompatibility. In addition, the expected results allow for the establishment of precise modification processes, e.g. for the loading of drug molecules, as well as predictions on the stability of surface modifications.