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In-situ characterization of MOVPE growth dynamics and of diffusion mechanisms in nitrides and their influence on optoelectronic properties of InGaN/AlGaN/GaN quantum structures

In-situ characterization of MOVPE growth dynamics and of diffusion mechanisms in nitrides and their influence on optoelectronic properties of InGaN/AlGaN/GaN quantum structures
MOVPE 生长动力学和氮化物扩散机制的原位表征及其对 InGaN/AlGaN/GaN 量子结构光电性能的影响
批准号:
426532685
负责人:
Professor Dr. Tilo Baumbach
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2019
资助国家:
德国
项目状态:
已结题
起止时间:
2018-12-31 至 2023-12-31

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中文摘要
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英文摘要
Non-uniform indium concentration is the major unsolved scientific problem strongly impeding technological progress in the growth of the InGaAlN materials system. The goal of the project is to gain a fundamental understanding of the growth and decomposition of InGaN/GaN produced by metalorganic vapor phase epitaxy (MOVPE), thus enabling optimization of the growth parameters for fabrication of InGaN/AlGaN quantum structures of blue and green LEDs and laser diodes. In particular, we want to elucidate the microscopic mechanisms of indium diffusion in the AlInGaN lattice in dependence on external parameters (especially temperature) and internal influences, such as lattice strain fields and defect type and concentrations at the moment (and temperature) of growth, which beside piezoelectric fields are important for the fundamental understanding of growth. Also, they are crucial unknown factors with implication on the technology of nitride devices- LEDs, lasers and transistors.
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