Process of Thin Liquid Film Formation in Spin Coating

旋涂液膜形成过程

• 批准号: 01460110
• 负责人: MATSUMOTO Yoichiro
• 金额: $ 4.74万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-01460110/
• 关键词: Liquid Film Flow; Rotating Disk; Spin Coating; Thin Film Formation; Heat and Mass Transfer Phase Change; Thickness Measurement; Numerical Analysis; 数値解析; 熱・物質移動; 可視化; 二相流; 移動境界

Theoretical and experimental analysis has been performed on the film formation phenomena. In this phenomena the solutions diluted by volatile solvents are deposited on a rotating disk, film flow is formed resulting from centrifugal forces, and then a thin dry film is obtained after the entire solvent evaporation.In the theoretical study performed here ; An axisymmetric 2-dimensional numerical analysis including heat and mass transfer is performed for the liquid film and the adjacent gas phase. In this analysis the solution forms and radial dependency are determined for all of the variables. A 1-dimensional modeling is performed using these solution forms and then the entire process from the spin-up to the thin dry film formation is analyzed. The behavior of the radial flow convection and the solvent evaporation, the solute concentration increase in the film, and the effect of the process parameters such as spinning speed and the initial solute concentration, are clearly shown in this analysis.In the experimental analysis a spin-coater is set up and the following experiments are performed ;1. Thin film is coated on the silicon wafer for integrated circuits and the final film thickness is measured by ellipse thickness analyzer. 2. Transient film thickness in the process is measured using laser displacement meter. For these experiments the thickness prediction by the numerical method mentioned above is performed and the results are compared. Excellent agreement is observed between them and the validity of the 1-dimensional calculation modeling is assured. 3. A shadowgraph visualization technique using argon-ion laser is applied on the film flow and showed that the surface wave observed in the initial stage vanishes in the process. 4. Mach-zehnder interferometer using argon-ion laser is applied and the distribution of the film thickness is measured. It can be concluded that almost uniform thickness is obtained.

对成膜现象进行了理论和实验分析。在这种现象中，由挥发性溶剂稀释的溶液被沉积在旋转盘上，膜流由离心力形成，然后在整个溶剂evaporation.In的理论研究中，获得一个薄的干膜在这里进行的轴对称的二维数值分析，包括传热和传质的液膜和相邻的气相进行。在该分析中，确定所有变量的解形式和径向依赖性。使用这些溶液形式进行1维建模，然后分析从旋转到薄干膜形成的整个过程。分析了径向对流和溶剂蒸发的行为，薄膜中溶质浓度的增加，以及工艺参数如旋涂速度和初始溶质浓度的影响。在实验分析中，建立了旋涂机并进行了以下实验：1.在集成电路用硅片上镀膜，用椭圆厚度分析仪测量薄膜厚度。2.用激光位移计测量了过程中的瞬态膜厚。对于这些实验，进行了上述数值方法的厚度预测，并对结果进行了比较。它们之间观察到良好的一致性和1维计算建模的有效性得到保证。3.采用氩离子激光的阴影可视化技术对膜流进行了研究，结果表明，在初始阶段观察到的表面波在过程中消失了。4.采用氩离子激光马赫-曾德尔干涉仪测量薄膜厚度分布。可以得出结论，获得了几乎均匀的厚度。

项目成果

Taku Ohara et.al: "The film formation dynamics in spin coating" Physis of FluidsA (Fluid Dynamics). 1-12. 1949-1959 (1989)

Taku Ohara 等人：“旋涂中的成膜动力学”Physis of FluidsA（流体动力学）。

Taku Ohara: "Film Thinning Process on a Rotating Disk" Proc. 3rd Int. Symp. on Transport Phenomena, Dynamics and Design of Rotating Machinery,. vol. 1. 186-201 (1990)

Taku Ohara：“旋转盘上的薄膜减薄过程”Proc。

Yoichiro Matsumoto: "Liquid Film Formation on a Rotating Disk" Transport Phenomena in Rotation Machinery, Hemisphere Pub.,. 117-126 (1990)

Yoichiro Matsumoto：“旋转盘上的液体薄膜形成”旋转机械中的传输现象，Hemisphere Pub.，。

Yoichiro Matsumoto: "Liguid Film Formation on a Rotating Disk" JSME Int. J. Ser.II. 32. 52-56 (1989)

松本洋一郎：“旋转盘上的液体薄膜形成”JSME Int。

Taku Ohara: "The Film Formation Dynamics in Spin Couting" Phys. Fluids A. 1. 1949-1959 (1989)

Taku Ohara：“旋转计算中的成膜动力学”物理。