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Development of InGaAs/GaAs strained single quantum well laser by phase looked epitaxy method.

Development of InGaAs/GaAs strained single quantum well laser by phase looked epitaxy method.
相视外延法研制InGaAs/GaAs应变单量子阱激光器。
批准号:
03452258
负责人:
YOSHII Kumayasu
金额:
$4.22万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1991
资助国家:
日本
项目状态:
已结题
起止时间:
1991 至 1992

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YOSHII Kumayasu的其他基金

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中文摘要
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英文摘要
The crystallinity and optical property of InGaAs/GaAs strained single quantum well(SSQW) structure were studied by photoluminescence (PL) method in relation to the crystal growth conditions. A PL spectrum of InGaAs/GaAs SSQW structure made by MBE at 540゚C showed a peak shift of the QW luminescence line toward the lower wave length than the theoretically estimated position. This fact suggests that In atoms evaporate during MBE growth of InGaAs layer, resulting in the decrease of chi in In_<chi>Ga_<1-chi>As active layer. Because the In evaporation is thermally enhanced process, it is considered that lowering the deposition temperature is effective to suppress the In evaporation.In order to reduce the growth temperature of the InGaAs layer, we grow the InGaAs layer by applying MEE method, which.is known as a effective technique to reduce the growth temperature of AlGaAs/GaAs alloy semiconductor system. The PL spectra of the SSQW structure grown by MEE method showed that the In evaporation … More could be controlled by decreasing the growth temperature to 290゚C. However, FWHM of the PL line became broader than the one from the SSQW structure made by MBE at 540゚C. Also the RHEED pattern showed that the crystal quality of the film made at low temperature is inferior to the high temperature grown film.The excess As adhesion and the low mobility of the group III atoms were believed to be the key factors to determine the crystal quality of the SSQW structure grown at low temperatures. So we optimized the low temperature MEE growth condition by increasing the migration time of the group III atoms and by reducing the As partial pressure. The SSQW structure made by the optimized low temperature MEE process showed the comparable qualities in optical and crystallographic properties to the films made by the high temperature MBE process.It is demonstrated that the highly controlled InGaAs/GaAs SSQW structure in composition, crystallinity and optical quality were made by the optimized low temperature MEE process, which may be the promising process to obtain the SSQW laser devices. Less
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Formation of Monochromatic Atomic Beam for Nanolithography
  • 批准号:
    10450059
  • 项目类别:
    Grant-in-Aid for Scientific Research (B).
  • 资助金额:
    $7.55万
  • 财政年份:
    1998
  • 负责人:
    YOSHII Kumayasu
  • 依托单位:
Low temperature growth of polycrystalline semiconductor and diamond films
  • 批准号:
    07455065
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $0.58万
  • 财政年份:
    1995
  • 负责人:
    YOSHII Kumayasu
  • 依托单位: