Preparation of functional metal oxide films from aqueous mist using atmospheric pressure glow plasma

利用常压辉光等离子体从水雾中制备功能性金属氧化物薄膜

• 批准号: 05650050
• 负责人: MARUYAMA Kazunori
• 金额: $ 1.41万
• 依托单位: Nagaoka Yniversity of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1993
• 资助国家: 日本
• 起止时间: 1993 至 1994
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-05650050/
• 关键词: Atmospheric pressure plasma; Radio frequency plasma; Aqueous mist; Zinc oxide; Orientation film; Sputter; 薄膜; フェライト

In order to establish a new film preparation system, a search was made for a preparation of ZnO films from Zn^<2+> aqueous mist using atmospheric pressure glow (APG) plasma. The plasma reactor was a pipe type quartz glass with double helical electrodes of copper ribbons. Aqueous mist of Zn^<2+> made by oscillator was passed through the furnace heated at 300ﾟC,condenser cooled to under 0ﾟC and then the reactor in a stream of argon followed by an application of RF power of 60-80W to make APG plasma. Tne fine particles of ZnO formed in the reactor by argon sputtering were brought onto the surface of the substrate heated at 100-200ﾟC in a stream of argon. X-ray diffraction patterns of all ZnO films obtained on glass substrate at various substrate temperature, indicated preferred c-axis orientation with wurtzite structure. It is very important for making c-axis oriented ZnO films that argon gas should be used and the removal of water vapor should be carried out exhaustively. A detailed comparison of the morphologies of ZnO films obtained by this method with that by simple pyrolysis of mist revealed the plasma effect on the film formation process to be sputtering effect to give hyper fine particles and/or clusters. This result was carried over to the following atmospheric pressure sputtering method using similar pipe type plasma reactor. Zinc oxide was coated on inner wall of this pipe type reactor. Argon gas was introduced into the reactor followed by an application of RF power of 60-80W to make APG plasma. X-ray diffraction patterns of all ZnO films obtained on glass substrate at various substrate temperature of 100-400ﾟC indicated preferred c-axis orientation with wurtzite structure.

为了建立一种新的薄膜制备体系，探索了用常压辉光等离子体从水雾中制备氧化锌薄膜的方法。等离子体反应器为管式石英玻璃，双螺旋电极为铜带。用振荡器产生的水雾经过300ﾟC加热的炉子，冷凝器冷却到0ﾟC以下，然后在氩气中反应，然后用60-80W的射频功率使APG等离子体产生。在Ar气流中加热到100-200ﾟC的温度下，在反应器中形成的氧化锌微粒被带到衬底表面。不同衬底温度下在玻璃衬底上制备的所有氧化锌薄膜的X射线衍射图表明，薄膜具有纤锌矿结构的c轴择优取向。在制备c轴取向氧化锌薄膜时，应充分利用Ar气体，并进行彻底的水蒸气去除。通过与单纯热解雾化法制备的氧化锌薄膜形貌的详细比较，发现等离子体对薄膜形成过程的影响主要是溅射效应，形成超细颗粒和/或团簇。这一结果被推广到使用类似管式等离子体反应器的常压溅射方法。该管式反应器的内壁涂覆了氧化锌。在反应器中引入Ar气体，然后用60-80W的射频功率制作APG等离子体。在不同衬底温度(100~400ﾟC)下，在玻璃衬底上制备的所有氧化锌薄膜的X射线衍射图均显示出具有纤锌矿结构的择优c轴取向。