The initial formation of the interface in the metal/compound-semiconductor system
The initial formation of the interface in the metal/compound-semiconductor system
批准号:
06452335
负责人:
OSAKA Toshiaki
金额:
$4.74万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
了解金属/半导体系统中界面的形成过程和原子结构对改进其技术具有重要意义。因此,尽管这种界面已经被广泛研究了几十年,但很少有与金属/化合物-半导体系统相关的工作被开展。在这项工作中,我们报告了Sn/InSb (111) A-2x2体系中界面形成的初始阶段的扫描隧道显微镜(STM)研究。到目前为止,该系统一直是RHEED研究和DV-X alpha计算的主题。然而,“Sn吸附在InSb (111) A-2x2表面的哪里?”的问题无法通过STM等直接方法得到回答。通过在460℃附近的狭窄温度范围内退火,可以在特高压条件下制备出干净、轮廓清晰的InSb (111) a -2x2衬底表面。InSb (111) A-2x2表面的STM观测揭示了Bohr等人已经报道的空位屈曲结构。例如,占位态的STM表现在高偏压下靠近in空位的第二层Sb的孤对和低偏压下in的最外层与Sb的第二层之间的成键轨道。偶尔会观察到边缘垂直于8[112]或[112]方向的双层台阶。在电子计数模型的基础上,提出了一种新的阶梯结构模型。Sn在InSb (111) A-2x2表面的以下三个位置非周期性吸附;in -vacancy的顶部位置,Sb在第二层,in在最外层。在这些吸附位点中,空位顶部最容易被Sn占据。
英文摘要
Understanding of the formation process and atomic structure of interfaces in the metal/semiconductor system is very important for improvements in its technology. Therefore, although such interfaces have been studied extensively for decades, little work associated with the metal/compound-semiconductor system has been carried out.In this work we report on the scanning tunneling microscopy (STM) study of the very initial stage of the interface formation in the Sn/InSb (111) A-2x2 system. So far this system has been the subject of RHEED investigation and DV-X alpha calculation. However, the question on "where is the Sn adsorbed on the InSb (111) A-2x2 surface? " has not been answered by direct methods such as STM.The clean and well-defined substrate surface of InSb (111) A-2x2 could be reproducibly prepared in UHV by annealing a sample in the narrow range near 460゚C.STM observations of the InSb (111) A-2x2 surface reveal the In-vacancy buckling structure which has been already reported by Bohr et al. For example, the STM for the occupied states manifests itself in the images corresponding to the lone-pair of Sb in the second layr near the In-vacancy at a high bias and to the bonding orbitals between the outermost layr of In and the second layr of Sb at a low bias. Occasionally, bilayr steps, the edges of which are perpendicular to eht [112] or [112] direction were observed. A novel model of these step structures is proposed on the basis of the electron counting model. The Sn is non-periodically adsorbed on the following three sites of the InSb (111) A-2x2 surface ; on-top sites of the In-vacancy, of the Sb in the second layr, and of the In in the outermost layr. Of these adsorption sites, the on-top of In-vacancy is most favorably occupied by Sn.
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Jun Nakamura: "Inhomogenious charge transfer in an incommensurate system" Physical Review B. 51. 5433-5436 (1995)
Jun Nakamura:“不相称系统中的非均匀电荷转移”物理评论 B. 51. 5433-5436 (1995)
DOI:
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通讯作者:
Hiroo Omi: "Polarity propagation in the InSb/alpha-Sn/InSb heterostructure" Physical Review Letters. 72. 2596-2599 (1994)
Hiroo Omi:“InSb/α-Sn/InSb 异质结构中的极性传播”物理评论快报。
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Jun Nakamura: "Surfactant-induced bond strengthening in as-grown film surface" Japanese Journal of Applied Physics. (印刷中). (1996)
Jun Nakamura:“生长薄膜表面的表面活性剂诱导粘合”,《日本应用物理学杂志》(出版中)。
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Jun Nakamura: "Surfactant-induced bond strengthening in as-grown film surface" Japanese Journal of Applied Physics. (in press). (1996)
Jun Nakamura:“生长薄膜表面的表面活性剂诱导的粘合强化”日本应用物理学杂志。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
[]
通讯作者:
Hiroo Omi: "Polarity propagation in the InSb/α-Sn/InSb heterostructure" Physical Review Letters. 72. 2596-2599 (1994)
Hiroo Omi:“InSb/α-Sn/InSb 异质结构中的极性传播”《物理评论快报》72. 2596-2599 (1994)。
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作者:
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共 9 条
Control of the heteroepitaxal growth on vicinal surfaces
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批准号:11555188
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项目类别:Grant-in-Aid for Scientific Research (B).
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资助金额:$4.03万
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财政年份:1999
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负责人:OSAKA Toshiaki
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依托单位:
Dynamical growth processes of group IV semiconducting films on the polar surfaces of compound semiconductors as assessed by RHEED rocking curve
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批准号:08455341
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.99万
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财政年份:1996
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负责人:OSAKA Toshiaki
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依托单位:
Study of Heteroepitaxial Growth Dynamic on Compound Semiconductor substrates
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批准号:02452248
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.52万
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财政年份:1990
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负责人:OSAKA Toshiaki
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依托单位:
Dynamical Observations of MBE Grown Thin Films by Ultrahigh Vacuum In-situ Electron Microscopy
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批准号:63550543
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.41万
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财政年份:1988
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负责人:OSAKA Toshiaki
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依托单位: