Micron Sized Robot Using Reversible Shape Memory Alloy Actuators

本项目总结如下。(1)设计了一台长度为1000微米的微米级手臂。(2)建立了一种长度为6000微米的毫米级臂的1自由度控制方法。(3)采用湿法腐蚀的方法在硅片上制作了微米级的单自由度机械臂。(4)较低的晶化温度(500ﾟC)有助于解决TiNi薄膜因膨胀速率不同而从基片上剥离的问题。(5)找到了在TiNi膜下对硅进行深度刻蚀的条件。

Summary of this project is as follows. (1)A Micron sized arm of 1000mum length was designed. (2)Control method was established using 1 degree of freedom of millimeter sized arm of 6000mum length. (3)One degree of freedom of micron sized arm was fabricated on silicon wafer by wet etching method. (4)Lower temperature 500ﾟC for crystalization of TiNi which will contribute on the solution of the problem "TiNi thin film peels off from substrate due to the difference of the rate of expansion", was found. (5)The etching condition for deep etch of Si below the TiNi film was found.