Nanolithography system

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The aim of our proposal is the setup of a versatile and flexible infrastructure for nanolithography at the institute for Physics of Rostock university. The main use of the proposed system is the combination of various nanostructures with two-dimensional crystals and van der Waals heterostructures. These novel material systems have fascinating electronic and optical properties. Access to nanolithography will enable us to tailor the properties of these systems, ranging from control of layer growth by definition of seed particles and control of light-matter-interaction via deterministic preparation of nano-antennae up to integration into devices by nanostructured contacts.For our planned activities, we require a flexible infrastructure for definition of structures on vastly different length scales. On one hand, plasmonic antennae, nanostructured contacts to two-dimensional crystals, seed particles and structures for introducing local strain require a lateral resolution of 30 nm or less. On the other hand, we need to define macroscopic contact regions and markers with structure sizes from 10 microns up to millimeters, which have to be deposited on large areas of a substrate.Additionally, our plans will require a precise alignment of the lithographically defined structures relative to two-dimensional crystals and heterostructures already present on a substrate, which have unique sizes and shapes due to the fabrication method. Therefore, the lithography system must also allow for high-resolution imaging of existing structures, which should be independent of the lithography process.