Evaluation method of radiative quantumn efficiency in amorphous semiconductor
非晶半导体辐射量子效率的评价方法
基本信息
- 批准号:06650013
- 负责人:
- 金额:$ 1.28万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for General Scientific Research (C)
- 财政年份:1994
- 资助国家:日本
- 起止时间:1994 至 1995
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
A radiative quantumn efficiency (RQE) in a thin film solid have been studied by using a photothermal deflection spectroscopy (PDS) and a photoacoustic spectroscopy (PAS). A main purpose is to develope the evaluation method for radiative quantumn efficiency of hydrogenated amorphous silicon, fullerene thin films, amorphous garium nitride and amorphous silicon oxide.(a) A radiative quantumn efficiency was obtained by the photo degradiation of photoluminescense, the value was about 30% in hydrogenated amorphous silicon at liquid nitrogen temperature. At the surface, the RQE was low because of the localized state at surface. Also the localized state density of a surface and bulk was estimated by PDS.The values are 9.5x10^<12>cm^<-2> and 1.8x10^<16>cm^<-2>, respectively.(b) The deflecting medium for a measurement of fullerene films has been found. And the RQE value was estimated by the photoluminescence degradiation effect by oxgen intercalation in the fullerene. The value was 5-10% at room temperature.(c) The film quality of silicon oxide produced by TICS is applicable to a TFT.The absorption coefficient spectrum of amorphous garium nitride was measured. The very long persistent photocurrent at room temperature was found in amorphous materials.(d) RQEPAS method was developed by using a PAS method. In this method, the errors of PPES method from light reflection at metal electrodes of piro device and the noise signal from transmitted light through metal electrodes was improved.(e) Photothermal bending spectroscopy was developed for the purpose of a measurement at vaccume. The sensitivity at present stage is 10^<-3>-10^<-4>. The merit and demerit has been demonstrated.
本文用光热偏转光谱(PDS)和光声光谱(PAS)研究了薄膜固体的辐射量子效率(RQE)。主要目的是发展氢化非晶硅、富勒烯薄膜、非晶氮化镓和非晶氧化硅的辐射量子效率的评价方法。(a)在液氮温度下,氢化非晶硅的光致发光的光降解得到了辐射量子效率,其值约为30%。在表面处,由于表面处的局域态,RQE较低。用PDS法计算了表面和体的局域态密度,其值分别为9.5 × 10 ~(13)<12>cm ~ 2<-2>和1.8 × 10 ~(13)<16>cm ~ 2<-2>。(b)找到了测量富勒烯薄膜的偏转介质,并利用氧嵌入富勒烯的光致发光降解效应估算了RQE值。室温下该值为5-10%。(c)用TICS生产的氧化硅薄膜质量可用于TFT。测量了非晶氮化镓的吸收系数谱。在室温下,在非晶态材料中发现了很长的持续光电流。(d)RQEPAS方法是通过使用PAS方法开发的。该方法克服了PPES方法中光在皮罗器件金属电极上的反射和透射光通过金属电极产生的噪声信号所带来的误差。(e)光热弯曲光谱是为了在真空下进行测量而开发的。现阶段的灵敏度为10^<-3>-10 ^<-4>。优点和缺点已经得到证明。
项目成果
期刊论文数量(34)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
野々村修一: "アモルファスシリコンメモリー" 応用物理. 64. 1013-1017 (1995)
野野村秀一:《非晶硅存储器》应用物理 64. 1013-1017 (1995)。
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S.Nonomura, S.Kobayashi, T.Gotoh, S.Hirata et.al.: "Photoconductive a-GaN prepared by reactive sputtering" Journal of Non-crystalline Solids. (in print). (1996)
S.Nonomura、S.Kobayashi、T.Gotoh、S.Hirata 等人:“通过反应溅射制备光电导 a-GaN”非晶固体杂志。
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S.Nonomura,S.Kobayashi,T.Gotoh,S.Hirata et.al.: "Photoconductive a-GaN prepared by reactive sputtering" Journal of Non-crystalline Solids. (in print). (1996)
S.Nonomura、S.Kobayashi、T.Gotoh、S.Hirata 等人:“反应溅射制备的光电导 a-GaN”非晶固体杂志。
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- 影响因子:0
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S.Hasegawa, T.Nishiwaki, H.Habuchi, S.Nitta, S.Nonomura: "Optical energy gap and below gap optical absorption of fullerene films measured by constant photocurrent method and photothermal deflection spectroscopy" Fullerene Science and Technology. 3. 163-17
S.Hasekawa、T.Nishiwaki、H.Habuchi、S.Nitta、S.Nonomura:“通过恒定光电流法和光热偏转光谱测量富勒烯薄膜的光学能隙和低于能隙的光学吸收”富勒烯科学与技术。
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野々村修一、後藤民浩、仁田昌二: "PDS(光熱偏向分光法)" 応用物理. 36. 1043-1044 (1994)
Shuichi Nonomura、Tamhiro Goto、Shoji Nita:“PDS(光热偏转光谱)”应用物理 36. 1043-1044 (1994)。
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{{ truncateString('NONOMURA Shuichi', 18)}}的其他基金
A study on estimation of localized states and its reduction in microcrystalline silicon films 〜An application of resonant photothenmal bending spectroscopy to hetero-structured films〜
微晶硅薄膜中局域态的估计及其还原研究〜共振光热弯曲光谱在异质结构薄膜中的应用〜
- 批准号:
14350163 - 财政年份:2002
- 资助金额:
$ 1.28万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
The Study of Light-induced Expansion in Hydrogenated Amorphous Silicon with Photodegradation
氢化非晶硅光致膨胀光降解研究
- 批准号:
10650304 - 财政年份:1998
- 资助金额:
$ 1.28万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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- 批准号:
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