STUDIES ON COMPOSIT PLATING AS A FABRICATING PROCESS FOR FUNCTIONAL THIN FILM
STUDIES ON COMPOSIT PLATING AS A FABRICATING PROCESS FOR FUNCTIONAL THIN FILM
批准号:
06650805
负责人:
HAYASHI Hidetaka
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
复合涂层具有耐磨性、自润滑性、耐腐蚀性和抗氧化性等功能。虽然复合涂层在许多工业过程中得到了应用,但分散相共沉积的机理尚未完全阐明。在本研究项目中,取得了以下结果:首先,阐明了氧化物颗粒(如二氧化钛颗粒)共沉积与吸附金属离子的种类和数量的关系。本研究主要采用含二氧化钛颗粒的酸性硫酸铜镀液。二氧化钛颗粒表面的羟基与镀液中的Cu2+反应,生成H+,并吸附在二氧化钛颗粒上。该反应既依赖于Cu2+的浓度,又依赖于溶液的pH值。结果表明,共沉积二氧化钛的量随着镀液pH值的增加而增加,说明共沉积粒子的量与粒子上吸附的Cu2+和Gt+的量有关。讨论了共沉积行为与金属离子沉积性质的关系。
英文摘要
Composite coating gives various functional properties, such as wear resistance, self-lubricating, corrosion or oxidation resistance etc.to the plated surface. Although the composite coatings are used in many industrial processes, the mechanism of codeposition of dispersoid is not fully elucidated.In this research project, the following results were obtained ; At first, the dependence of the codeposition of oxide particles, such as titanium dioxide particles, on the kind and the amount of adsorbed mental ion was elucidated. An acid copper sulfate bath with titanium dioxide particles was mainly used for this investigation. The surface OH group of the titanium dioxide particle reacts with Cu^<2+> in the bath, which results in H^+ production and the adsorption of Cu^<2+> on the particle. This reaction depends both on the concentration of Cu^<2+> and on the pH of the solution. It was found that the amount of codeposited titanium dioxide increased with increasing pH of the bath, which indicates that the amount of codepositing particles depends upon the amount of Cu^<2+> adsorbed on the particle. Relation between the codeposition behavior and the nature of depositing metal ion is also discussed.
期刊论文(2)
专著(0)
科研奖励(0)
会议论文
林 秀孝: "分散めっきにおける共析機構" 表面技術. 45. 1250-1253 (1994)
Hidetaka Hayashi:“分散电镀中的共析机制”表面技术 45. 1250-1253 (1994)。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
Fabrication of specifically organized composite film by using anisotropic graphite particle
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批准号:18560696
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.46万
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财政年份:2006
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负责人:HAYASHI Hidetaka
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依托单位:
Electrodeposition of metal/hydeoxide nano-composite material
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批准号:13650782
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.98万
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财政年份:2001
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负责人:HAYASHI Hidetaka
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依托单位:
ANALYSIS ON THE PRODUCTION PROCESS AND THE ELECTROREDUCTION PROCESS OF THE DOUBLE METAL HYDROXIDE AS A PRECURSOR OF ALLOY PLATING
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批准号:09650790
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.18万
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财政年份:1997
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负责人:HAYASHI Hidetaka
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依托单位:
Studies on the catalytic properties of metal oxide thin film on the molten salt liquid film
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批准号:63550606
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.28万
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财政年份:1988
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负责人:HAYASHI Hidetaka
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依托单位: