Study of High-Spatial Resolution Strain Measurements in Semiconductor Devices Using Tip-Enhanced Raman Spectroscopy
Study of High-Spatial Resolution Strain Measurements in Semiconductor Devices Using Tip-Enhanced Raman Spectroscopy
批准号:
23860051
负责人:
KOSEMURA Daisuke
金额:
$1.91万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Research Activity Start-up
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012
中文摘要
将拉曼光谱与原子力显微镜(AFM)相结合,实现了尖端增强拉曼光谱(TERS)。远场信号(背景)频繁地干扰我们从得到的光谱中推导出TERS信号。为了抑制背景,我们详细地研究了背景和信号的极化特性。因此,在入射光和散射光分别为p偏振和s偏振的条件下,[110]获得了高强度的TERS信号与背景的比。通过将实验结果与基于尖端增强模型的计算结果与“尖端放大张量”进行比较,得到了约1.6〓105的增强因子。获得的增强因子值高于先前报道的约104。在剪切力AFM测量中,高增强因子的原因被认为是在样品表面附近留有尖端。
英文摘要
Tip-enhanced Raman spectroscopy (TERS) was realized by combining Raman spectroscopy and atomic force microscopy (AFM). Far-field signal (background) frequently interrupts us to derive the TERS signal from obtained spectra. To suppress the background, the polarization properties of both TERS signal and background were examined in detail. As a result, high-intensity ratio of the TERS signal to background was obtained in the conditions of [110] incidence and p and s polarizations of the incident and scattered lights, respectively. Anenhancement factor of approximately 1.6 〓 105 was obtained by comparing the experimental results and calculations based on the tip-enhanced modeling with the “tip-amplification tensor.” The obtained value of the enhancement factor was higher than the previously reported value of about104. The reason for the high enhancement factor is considered to be the tip apex remaining in the vicinity of the sample surface in the shear-force AFM measurements.
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Characterization ofanisotropic strain relaxation after mesaisolation for strained SGOI and SiGe/Si structure with newly developed high-NAand oil-immersion Raman method
采用新开发的高数值孔径和油浸拉曼方法表征应变 SGOI 和 SiGe/Si 结构中隔离后的各向异性应变弛豫
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[K. Usuda, D. Kosemura, M. Tomita, A.Ogura, and T. Tezuka]
通讯作者:
and T. Tezuka
Evaluation of Anisotropic Stress Relaxation in Mesa-Shaped Strained Si Layers by FEM Simulation
通过有限元模拟评估台面形应变硅层中的各向异性应力松弛
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[Motohiro Tomita, Daisuke Kosemura, Koji Usuda, Tsutomu Tezuka, Atsushi Ogura]
通讯作者:
Atsushi Ogura
Investigation of Phonon DeformationPotentials in Si_<1_x>Ge_x by Oil-ImmersionRaman Spectroscopy
油浸拉曼光谱研究Si_<1_x>Ge_x的声子变形势
DOI:
10.1143/apex.5.111301
发表时间:
2012
期刊:
Appl. Phys. Express
影响因子:
--
作者:
[D. Kosemura, K. Usuda, and A. Ogura]
通讯作者:
and A. Ogura
Channel Strain Measurement in 32-nm-Node Complementary Metal-Oxide-Semiconductor Field-Effect Transistor by Raman Spectroscopy
通过拉曼光谱测量 32 纳米节点互补金属氧化物半导体场效应晶体管的通道应变
DOI:
10.1143/jjap.51.04da04
发表时间:
2012
期刊:
Japanese Journal of Applied Physics
影响因子:
1.5
作者:
[Rei Yamagishi, Kiyotaka Obunai, Tadao Fukuta, Koichi Ozaki, Yusuke Numata, Munehisa Takei]
通讯作者:
Munehisa Takei
TO Phonon Excitation Using Surface Enhanced Raman Scattering for Stress Evaluation
使用表面增强拉曼散射进行 TO 声子激发进行应力评估
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[H. Hashiguchi, M. Takei, D. Kosemura, A.Ogura]
通讯作者:
A.Ogura
共 37 条
Examination of anisotropic stress state evaluation in III-V compound semiconductors by oil-immersion Raman spectroscopy
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批准号:25790049
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项目类别:Grant-in-Aid for Young Scientists (B)
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资助金额:$2.5万
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财政年份:2013
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负责人:KOSEMURA Daisuke
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依托单位:
海外基金