Optical Metrology System

光学计量系统

• 批准号: 453679893
• 金额: --
• 依托单位: Gottfried Wilhelm Leibniz Universität Hannover
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2020
• 资助国家: 德国
• 起止时间: 2019-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/453679893?language=en
• 关键词: Optical; Metrology; System

We propose an Optical Metrology System as one of three main components of a modular Nanoproduction Facility. As integral part of the facility, the system will enable geometrical multi-scale and high-resolution measurements of 2D, 2.5D and 3D micro- and nanostructures. The metrology system includes five modalities, (i) interference microscopy, (ii) thin film measurement, (iii) confocal microscopy, (iv) active illumination focus variation, and (v) atomic force microscopy, incorporated in one off-line module. It will be used for precisely measuring the structure geometries, dimensions, feature sizes and surface roughness. Within the modular Nanoproduction Facility, the Optical Metrology System will be used for the measurement and characterization of 2D, 2.5D, and 3D micro- and nanostructures realized using both a Laser Nanofabrication System based on two-photon polymerization (TPP) and a Nanoimprint Lithography System (UV-NIL). All modules will be implemented in a multi-scale production chain for the realization of various integrated optical elements, subsystems, and entire functional systems for a variety of applications ranging from optical networks over monitoring and sensing to imaging and metamaterials.The proposed Optical Metrology System - and ultimately the modular Nanoproduction Facility - provides a combined production and characterization environment and will be broadly utilized by the groups of the four main users and a number of additional collaborators. It will be located in a common infrastructure for optimal access and operation. One research group of the applicants will organize operation and service. The requested system is currently not available in the groups of the planned users.

我们提出了一个光学计量系统作为一个模块化纳米生产设施的三个主要组成部分之一。作为该设施的组成部分，该系统将能够对2D、2.5D和3D微纳米结构进行几何多尺度和高分辨率测量。计量系统包括五种模式，(i)干涉显微镜，（ii）薄膜测量，（iii）共聚焦显微镜，（iv）主动照明焦点变化，和(v)原子力显微镜，合并在一个离线模块中。它将用于精确测量结构的几何形状、尺寸、特征尺寸和表面粗糙度。在模块化纳米生产设施中，光学计量系统将用于测量和表征2D， 2.5D和3D微纳米结构，这些微纳米结构使用基于双光子聚合（TPP）的激光纳米加工系统和纳米压印光刻系统（UV-NIL）实现。所有模块将在多规模生产链中实现各种集成光学元件、子系统和整个功能系统，用于各种应用，从监视和传感的光网络到成像和超材料。提议的光学计量系统——以及最终的模块化纳米生产设施——提供了一个综合的生产和表征环境，并将被四个主要用户和一些额外的合作者广泛利用。它将位于一个共同的基础设施，以获得最佳的访问和操作。申请者组成一个研究小组组织运营和服务。所请求的系统目前在计划的用户组中不可用。