Fabrication cluster with molecular beam epitaxy, glovebox sytem and scanning probe lithography

采用分子束外延、手套箱系统和扫描探针光刻技术的制造集群

• 批准号: 455328906
• 金额: --
• 依托单位: Universität Münster
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2021
• 资助国家: 德国
• 起止时间: 2020-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/455328906?language=en
• 关键词: Fabrication; cluster; molecular; beam; epitaxy

For studying the effect of nano-confinement on the properties of phase change materials, it is essential to have the ability to create such samples in a clean and reproducible way with a precise control of the confinement conditions. For the fabrication of such nanostructured devices, we have to set up an integrated instrument with a molecular beam epitaxy system at its core. In this tool, extremely thin films of phase change materials can be grown under cleanest conditions and with atomic precision regarding the thickness of those layers. In order to keep the material uncontaminated also during lateral nano-structuring of such thin films into three-dimensionally confined nanodevices, the molecular beam epitaxy system is connected to a glovebox filled with argon gas. In this inert atmosphere the lithography is performed with the help of a thermal scanning probe nanolithography tool. The lithography tool is positioned in a dedicated compartment of the glove box system that is specially designed to guarantee the vibration isolation required for the nanolithography processes.

为了研究纳米限制对相变材料性能的影响，必须能够以清洁和可再现的方式创建此类样品，并精确控制限制条件。为了制造这种纳米结构的器件，我们必须建立一个集成的仪器与分子束外延系统在其核心。在这种工具中，相变材料的极薄薄膜可以在最清洁的条件下生长，并且关于这些层的厚度具有原子精度。为了在将这种薄膜横向纳米结构化成三维限制的纳米器件期间也保持材料不受污染，分子束外延系统连接到填充有氩气的手套箱。在这种惰性气氛中，在热扫描探针纳米光刻工具的帮助下进行光刻。光刻工具位于手套箱系统的专用隔室中，该手套箱系统专门设计用于保证纳米光刻工艺所需的振动隔离。