Fabrication cluster with molecular beam epitaxy, glovebox sytem and scanning probe lithography

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For studying the effect of nano-confinement on the properties of phase change materials, it is essential to have the ability to create such samples in a clean and reproducible way with a precise control of the confinement conditions. For the fabrication of such nanostructured devices, we have to set up an integrated instrument with a molecular beam epitaxy system at its core. In this tool, extremely thin films of phase change materials can be grown under cleanest conditions and with atomic precision regarding the thickness of those layers. In order to keep the material uncontaminated also during lateral nano-structuring of such thin films into three-dimensionally confined nanodevices, the molecular beam epitaxy system is connected to a glovebox filled with argon gas. In this inert atmosphere the lithography is performed with the help of a thermal scanning probe nanolithography tool. The lithography tool is positioned in a dedicated compartment of the glove box system that is specially designed to guarantee the vibration isolation required for the nanolithography processes.