A STUDY ON ULTRA-HARD FILM FORMATION BY MACROPARTICLE ION BEAM WITH HIGH ENERGY

高能大粒子离子束形成超硬膜的研究

• 批准号: 10450119
• 负责人: TAKOKA Gikan
• 金额: $ 8.38万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B).
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-10450119/
• 关键词: macroparticle; fullerene; Argon cluster; multicollisions; high density irradiation; film formation; carbon film; クラスター; イオンビーム; Arクラスター; 非線形照射効果; ビッカース硬度

In this project, we have investigated on film formation by using macroparticles such as fullerene (C_<60>) and Argon cluster ions. Also, we have studied on an interaction between ion beams and a solid surface. It was found that irradiation of macroparticles has unique characteristics such as multicollisons, high density irradiation, etc., which deviate significantly from monomer ion irradiation. Films prepared by this method exhibited Vickers hardness value of 5,000 kg/mm^2 and no hydrogen inclusion. These films exhibited good properties of hardness, adhesion and wear resistance, compared with a typical value of 3,000 kg/mm^2 for films prepared by other methods. High density irradiation on a solid surface with high energetic macroparticles was capable to produce the phase modification from fullerene to diamond-like-carbon with high hardness and very smooth surface, which was also clarified by the computer simulation based on molecular dynamic simulation. Furthermore, deposition on substrates with high thermal expansion coefficients such as steel, iron and other materials was studied, and it was capable to apply to the films for industrial use.

在本计画中，我们研究了以富勒烯（C_）及氩原子团簇离子等大粒子作为成膜材料<60>。此外，我们还研究了离子束与固体表面的相互作用。发现大颗粒的辐照具有独特的特性，如多碰撞、高密度辐照等，其显著偏离单体离子辐照。用这种方法制备的薄膜的维氏硬度值为5，000 kg/mm^2，没有氢夹杂。这些薄膜表现出良好的硬度、附着力和耐磨性，而其他方法制备的薄膜的典型值为3，000 kg/mm^2。高密度辐照高能大颗粒固体表面能够产生由富勒烯到具有高硬度和非常光滑的表面的类金刚石碳的相改性，这也通过基于分子动力学模拟的计算机模拟得到证实。此外，还研究了在高热膨胀系数的钢、铁等材料上的沉积，并将其应用于工业应用。

项目成果

J.Matsuo, G.H.Takaoka, I.Yamada: "Ar Cluster Ion Bombardment Effects on Semiconductor Surfaces"Proceedings of 2000 MRS Fall Meetings. (2001)

J.Matsuo、G.H.Takaoka、I.Yamada：“Ar 簇离子轰击对半导体表面的影响”2000 年 MRS 秋季会议记录。

I.Yamada: "Gas Cluster Ion Beams for Processing New Materials" Physics of Clusters. No.3. 74-85 (1998)

I.Yamada：“用于加工新材料的气体团簇离子束”团簇物理。

J.Matsuo, I.Yamada: "Molecular Dynamics Simulation of a Carbon Cluster Ion Impacting on a Carbon Surface" Materials Chemistry and Physics. Vol.54. 139-142 (1998)

J.Matsuo、I.Yamada：“碳簇离子撞击碳表面的分子动力学模拟”材料化学和物理。

J.Matsuo, I.Yamada: "Angular Distributions of the Particles Sputterd with Ar Cluster Ions" Materials Chemistry and Physics. Vol.54. 262-265 (1998)

J.Matsuo、I.Yamada：“Ar 簇离子溅射粒子的角分布”材料化学和物理。

J.Matsuo,I.Yamada: "Fullerene Ion (C60^^+) Implantation in GaAs (100) Substrate"Proceedings of the 12th International Conference on Ion Implantation Technology-IIT98. 1203-1206 (1999)

J.Matsuo，I.Yamada：“GaAs (100) 基板中的富勒烯离子 (C60^^) 注入”第 12 届国际离子注入技术会议 - IIT98 的会议记录。