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Rapid annealing of hexagonal ferrite hard disk for high density recording media with low noise

Rapid annealing of hexagonal ferrite hard disk for high density recording media with low noise
低噪声高密度记录介质六方铁氧体硬盘的快速退火
批准号:
10555102
负责人:
MORISAKO Akimitsu
金额:
$7.81万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B).
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 2000

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中文摘要
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英文摘要
High magnetic anisotropy and vety small grain size are necessary for the future high density magnetic recording. In this study, we have focused both Ba- abd Sr-ferrite supttered thin films for ultra high density recording media.We found that Bi addition is effective to lower the crystallization temperature.This results in the suppress of the grain growth and grain size is in the range from 40 to 80 nm at the substrate temperature of 550 C.The grain size of simple hexagonal ferrite films without any additives was in the range from 100 to 150 nm. We found that the addition of Bi can reduce the grain size down to about half. Another experiment on rapid annealing was also carried out for Bi-Ba-ferrite thin films. The grain size can be reduced to 30 to 40 nm by annealing at 750 C for 30 seconds. Coercivity of rapid annealed Ba-ferrite thin films is around 3.7 kOe. The recording characteristics of Ba-ferrite thin film hard disk was evaluated by using merged type magnetic head. The recording density, D50, is in the range from 210 to 230 kfipi. The highest recording density is about 310 kfipi and this bit length almost corresponds to the grain size. This suggests Ba-ferrite thin film disk has high potential for ultra high density recording, when the grain size is reduced to about 10 nm or smaller. Another approach to reduce the grain size should be necessary for the developing Ba-ferrile thin films with nano-scaled grain size.
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A.Morisako, T.Kubono, M.Matsumoto: "Properties of Bi added barium ferrite thin films for high-density magnetic recording media"Proc.of NAGANO magel'99. 267-270 (1999)
A.Morisako、T.Kubono、M.Matsumoto:“用于高密度磁记录介质的添加 Bi 的钡铁氧体薄膜的特性”Proc.of NAGANO Magel99。
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A.Morisako, M.Saitoh, and M.Matsumoto: "Effect of chromium addition on the properties of sputtered strontium ferrite films"Journal of Applied Physics. 87,9. 6872-6874 (2000)
A. Morisako、M. Saitoh 和 M. Matsumoto:“铬添加对溅射锶铁氧体薄膜性能的影响”应用物理学杂志。
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通讯作者:
森迫昭光,松本光功,斉藤誠: "SrM薄膜における磁気特性のターゲット組成依存性"日本応用磁気学会誌. 23. 1221-1224 (1999)
Akimitsu Morisako、Mitsutoshi Matsumoto、Makoto Saito:“SrM 薄膜中磁性的目标成分依赖性”日本应用磁学学会杂志 23. 1221-1224 (1999)。
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森迫昭光、斉藤誠、松本光功: "高密度記録用ストロンチウムフェライト薄膜の特性"電気学会研究会試資料. MAG00. 55-59 (2000)
Akimitsu Morisako、Makoto Saito、Mitsutoshi Matsumoto:“用于高密度记录的锶铁氧体薄膜的特性”MAG00 (2000)。
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24
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    • 批准号:
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    • 项目类别:
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    • 财政年份:
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    • 依托单位:
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    • 批准号:
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    • 项目类别:
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