Growth of Binary Compound Semiconductors of Uniform Compositions By One-Directionnal Growth Method with a Nonuniform Concentration Distribution
Growth of Binary Compound Semiconductors of Uniform Compositions By One-Directionnal Growth Method with a Nonuniform Concentration Distribution
批准号:
11555061
负责人:
MAEKAWA Toru
金额:
$7.87万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2001
中文摘要
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英文摘要
I investigated the validity of a new growth method for producing binary semiconductor crystals, which have uniform compositions, utilizing microgravity conditions. First, I developed a calculation method of growth of binary semiconductor crystals from a macroscopic point of view based on thermofluid dynamics. The shape and movement of the solution-crystal interfaces as well as the flow, temperature and concentration fields can be estimated efficiently. The growth process of an InAs-GaAs binary crystal by the Bridgman and zone methods were investigated and the following results were obtained :(a) Bridgman method :(1) The temperature field is not seriously deformed by convection since the Prandtl number of the molten compound semiconductors is very small.(2) The concentration field and the solution-crystal interface are deformed by buoyancy convection even under microgravity when the crystal growth direction is perpendicular to the residual gravity, since the Schmidt number is large.(3) As the crystal size and the heat flux increase, the deformation of the concentration field and the solution-crystal interface becomes more extensive.(b) Zonemethod :(1) The convective velocity is reduced by employing the zone method.(2) The velocity and the deformation of the temperature and concentration fields and the solution-crystal interfaces are reduced remarkably and, as a result, supercooling is suppressed by reducing the zone width.(3) A uniform In0.3Ga0.7As single crystal may be grown by reducing the zone width to 15 mm and setting the temperature gradient in the zone at 10 K/cm.
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Matsumoto S, Maekawa T, Kato H, Yoda S and Kinoshita K: "Crystal growth of a binary semiconductor of uniform compositions"Adv. Space Res.. 24. 1279-1282 (1999)
Matsumoto S、Maekawa T、Kato H、Yoda S 和 Kinoshita K:“均匀成分二元半导体的晶体生长”Adv。
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作者:
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通讯作者:
Y.Hiraoka,K.Ikegami,T.Maekawa,S.Matsumoto,S.Yoda,K.Kinoshita: "Crystal Growth of a Binary Compound Semiconductor under Microgravity Conditions"Proc.The 33rd COSPAR (Committee on Space Research) Scientific Assembly. G0.1. 0050 (2000)
Y.Hiraoka、K.Ikegami、T.Maekawa、S.Matsumoto、S.Yoda、K.Kinoshita:“微重力条件下二元化合物半导体的晶体生长”Proc.第 33 届 COSPAR(空间研究委员会)科学大会。
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通讯作者:
Matsumoto S, Maekawa T: "InP solution growth by the travelling heater method"Int.J.Transport Phenomena. 1. 165-172 (1999)
Matsumoto S、Maekawa T:“通过移动加热器法生长 InP 溶液”Int.J. 传输现象。
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S.Matsumoto and T.Maekawa: "Constitutional Supercooling Induced during InP Solution Growth"Adv.Space Res.. Vol.24,No.10. 1215-1218 (1999)
S.Matsumoto 和 T.Maekawa:“InP 溶液生长过程中诱导的结构过冷”Adv.Space Res.。第 24 卷,第 10 期。
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作者:
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通讯作者:
Matsumoto S and Maekawa T: "Constitutional supercooling induced during InP solution growth"Adv. Space Res.. 24. 1215-1218 (1999)
Matsumoto S 和 Maekawa T:“InP 溶液生长过程中诱导的结构过冷”Adv.
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共 30 条
Creation of novel nano structures at room/low temperature utilising critical fluids
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批准号:24656148
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资助金额:$2.58万
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财政年份:2012
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财政年份:2001
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负责人:MAEKAWA Toru
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依托单位: