Development of Automatic Detection Machine for Contaminants on Wafer and Crystal Originated Particles (COP) in Wafer with Nano-meter order

纳米级晶圆污染物及晶圆内晶源颗粒（COP）自动检测机研制

• 批准号: 14350217
• 负责人: AKIYAMA Nobuyuki
• 金额: $ 3.2万
• 依托单位: Nagaoka University of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-14350217/
• 关键词: particle detection; COP (crystal originated particle) detection; scattered light detection; CZ wafer; FZ wafer

In this study, an experiment and a theoretical analysis to detect the small particles adhering to a wafer and the crystal originated particles (COPs) existing in the wafer, whose diameters are approximately 0.1μm, are carried out successfully. The technology to separate COPs from detected particles is also carried outThe intensity distribution of light scattered by particles and COPs is calculated using the Maxwell equation under the assumption that they are illuminated by laser light. The finite difference time domain (FD-TD) method is used to solve the Maxwell equation. On the basis of the above mentioned results, it is theoretically verified that both particles and COPS larger than 0.1 μm in diameter are detected and recognized independentlyFor the experiment, both particles and COPs are detected when an Ar-ion laser is illuminated perpendicularly downward onto the wafer, and the obliquely scattered light is detected using a photomultiplier tube No.1. Only particles are detected when a YAG laser is illuminated obliquely with an incident angle of 77ー and the light scattered perpendicularly upward is detected using a photomultiplier tube No.2. On the basis of the two detected signals, the particles and COPs can be recognized independentlyThe experiment was conducted using two types of wafers. One is a wafer made by a Czochralski (CZ) method, which is known as a wafer with COPs, and the other is a wafer made by a floating zone (FZ) method, which is known as a non-COP wafer. COPs are detected on the CZ wafer but not on the FZ wafer. On the basis of this experimental result, it is experimentally verified that COPs can be detected.by this detection methodThe experimental results coincide with the theoretical results

本研究成功地对直径约为0.1μm的硅片上附着的小颗粒和晶片中存在的晶源颗粒(COP)进行了检测实验和理论分析。利用麦克斯韦方程计算了粒子和COPS在激光照射下的光强分布。采用时域有限差分法(FD-TD)求解麦克斯韦方程。在上述结果的基础上，从理论上验证了直径大于0.1μm的粒子和COPS的探测和识别是独立的。在实验中，当Ar离子激光垂直向下照射到晶片上时，粒子和COPS都被探测到，斜散射光是用1号光电倍增管探测的。当入射角度为77ー的激光倾斜照射时，用2号光电倍增管探测垂直向上散射的光时，只能探测到粒子。根据这两个检测信号，可以独立地识别颗粒和COPS。一种是由Czochralski(CZ)方法制造的晶片，被称为带有CoS的晶片；另一种是通过浮动区(FZ)方法制造的晶片，被称为非CoP晶片。在CZ晶片上检测到COPS，但在FZ晶片上没有检测到COPS。在此实验结果的基础上，通过实验验证了该检测方法能够检测到COPS，实验结果与理论结果相吻合

项目成果

秋山伸幸, 鈴木寿朗, 川田賢司, 吉田昌弘, 八掛保夫: "SiO_2薄膜付きウエハ上微粒子からの散乱光検出"精密工学会誌. 68. 531-535 (2002)

Nobuyuki Akiyama、Toshiro Suzuki、Kenji Kawada、Masahiro Yoshida、Yasuo Yakake：“用 SiO_2 薄膜检测晶圆上细颗粒的散射光”日本精密工程学会杂志 68. 531-535 (2002)。

Nobuyuki AKIYAMA, Toshiaki SUZUKI, Kenji KAWATA, Masahiro YOSHIDA, Yasuo YATSUGAKE: "Detection of Light Scattered by Particles on Silicon Wafer"Journal of the Japan Society for Precision Engineering. Vol.68. 531-535 (2002)

Nobuyuki AKIYAMA、Toshiaki SUZUKI、Kenji KAWATA、Masahiro YOSHIDA、Yasuo YATSUGAKE：《硅晶片上粒子散射光的检测》日本精密工程学会期刊。

秋山伸幸, 鈴木寿朗, 川田賢司, 吉田昌弘, 八掛保夫: "SiO_2薄膜付きウエハ上微粒子からの散乱光検出"精密工学会誌. 68巻4号. 531-535 (2002)

Nobuyuki Akiyama、Toshiro Suzuki、Kenji Kawada、Masahiro Yoshida、Yasuo Yakake：“利用 SiO_2 薄膜检测晶圆上细小颗粒的散射光”，日本精密工程学会杂志，第 68 卷，第 4 期，531-。 535（2002）