Development of single nano materials based on quantum beam and data science
Development of single nano materials based on quantum beam and data science
批准号:
18H03895
负责人:
Kozawa Takahiro
金额:
$27.96万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2018
资助国家:
日本
项目状态:
已结题
起止时间:
2018-04-01 至 2023-03-31
中文摘要
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英文摘要
期刊论文(62)
专著(0)
科研奖励(0)
会议论文
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Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography
含有 C-(4-t-丁基苯并)杯[4]间苯二酚的超支化聚缩醛的合成:极紫外 (EUV) 光刻的抗蚀性能
DOI:
10.1016/j.reactfunctpolym.2018.08.013
发表时间:
2018
期刊:
Reactive and Functional Polymers
影响因子:
5.1
作者:
[Kudo Hiroto, Fukunaga Mari, Shiotsuki Kohei, Takeda Hiroya, Yamamoto Hiroki, Kozawa Takahiro, Watanabe Takeo]
通讯作者:
Watanabe Takeo
Defect Risks in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
用于极紫外光刻的化学增强抗蚀剂的缺陷风险
DOI:
--
发表时间:
2022
期刊:
影响因子:
--
作者:
[中村 直人, Takahiro Kozawa]
通讯作者:
Takahiro Kozawa
Stochastic Effects in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
用于极紫外光刻的化学放大光刻胶的随机效应
DOI:
--
发表时间:
2021
期刊:
影响因子:
--
作者:
[堀岡正崇, 荒川 雅, 南川賢人, 西川享佑, 河野知生, 寺嵜 亨, T. Kozawa]
通讯作者:
T. Kozawa
Resist thickness dependence of latent images in chemically amplified resists used for electron beam lithography
用于电子束光刻的化学放大抗蚀剂中潜像的抗蚀剂厚度依赖性
DOI:
--
发表时间:
2021
期刊:
影响因子:
--
作者:
[Gao Yunpeng, Feng Chi, Seo Tamae, Kubota Koji, Ito Hajime, T. Kozawa and T. Tamura]
通讯作者:
T. Kozawa and T. Tamura
EUVL Stochastics Symposium
EUVL随机研讨会
DOI:
--
发表时间:
2021
期刊:
影响因子:
--
作者:
[Yang Jin-Peng, Ren Si-Xian, Yamaguchi Takuma, Meissner Matthias, Cheng Li-wen, Zhou Lei, Ideta Shinichiro, Tanaka Kiyohisa, Kera Satoshi, T. Kozawa]
通讯作者:
T. Kozawa
共 55 条
Demonstration of water vapor-assisted joining in heating environment and application to fabricating porous electrodes for secondary batteries
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批准号:15K17917
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项目类别:Grant-in-Aid for Young Scientists (B)
-
资助金额:$2.66万
-
财政年份:2015
-
负责人:Kozawa Takahiro
-
依托单位:
Study on nanochemistry in latest nanofabrication materials using quantum beams
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批准号:25246036
-
项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$29.04万
-
财政年份:2013
-
负责人:Kozawa Takahiro
-
依托单位: