Elucidation of dynamic characters of dislocations and their electronic and optical properties in wide bandgap semiconductors
Elucidation of dynamic characters of dislocations and their electronic and optical properties in wide bandgap semiconductors
批准号:
24246103
负责人:
YONENAGA Ichiro
金额:
$30.62万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012-04-01 至 2015-03-31
中文摘要
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英文摘要
期刊论文(37)
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Vacancy-type defects introduced by plastic deformation of GaN studied using monoenergetic positron beams
使用单能正电子束研究 GaN 塑性变形引入的空位型缺陷
DOI:
10.1063/1.4819798
发表时间:
2013
期刊:
J. Appl. Phys.
影响因子:
--
作者:
[A. Uedono, I. Yonenaga, T. Watanabe, S. Kimura, N. Ohsaima, R. Suzuki, S. Ishibashi and Y. Ohno]
通讯作者:
S. Ishibashi and Y. Ohno
Formation and Evolution of Misoriented Grains in <i>a</i>-Plane Oriented Gallium Nitride Layers
<i>a</i>平面取向氮化镓层中错误取向晶粒的形成与演化
DOI:
10.2320/matertrans.ma201221
发表时间:
2012
期刊:
MATERIALS TRANSACTIONS
影响因子:
1.2
作者:
[Y. Tokumoto, H-J. Lee, Y. Ohno, T. Yao and I. Yonenaga]
通讯作者:
T. Yao and I. Yonenaga
Dislocation structure in AlN films induced by in situ transmission electron microscope nanoindentation
原位透射电子显微镜纳米压痕诱导AlN薄膜中的位错结构
DOI:
10.1063/1.4764928
发表时间:
2012
期刊:
J. Appl. Phys.
影响因子:
--
作者:
[Y. Tokumoto, K. Kutsukake, Y. Ohno and I. Yonenaga]
通讯作者:
Y. Ohno and I. Yonenaga
Dislocation dynamics in AlN films induced by in situ TEM nanoindentation
原位 TEM 纳米压痕引起的 AlN 薄膜中的位错动力学
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[Y. Tokumoto, K. Kutsukake, Y. Ohno, I. Yonenaga]
通讯作者:
I. Yonenaga
Influence of Isoelectronic Te Doping on the Physical Properties of ZnO Films Grown by Molecular-Beam Epitaxy
等电子Te掺杂对分子束外延ZnO薄膜物理性能的影响
DOI:
10.7567/jjap.52.055501
发表时间:
2013
期刊:
J. J. Appl. Phys.
影响因子:
--
作者:
[S-H. Park, T. Minegishi, D-C. Oh, D-J. Kim, J-H. Chang, T. Yao, T. Taishi and I. Yonenaga]
通讯作者:
T. Taishi and I. Yonenaga
共 32 条
Basic studies for magnetic functional silicon devices utilizing highly dislocated structures
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批准号:23656380
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.5万
-
财政年份:2011
-
负责人:YONENAGA Ichiro
-
依托单位:
Growth and Fundamental Properties of GeSi Bulk Crystals
-
批准号:13450001
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.54万
-
财政年份:2001
-
负责人:YONENAGA Ichiro
-
依托单位: