Development of coherent VUV Light Source for F_2 Laser Lithography

F_2激光光刻相干VUV光源的研制

• 批准号: 13555010
• 负责人: WATANABE Shuntaro
• 金额: $ 8.64万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13555010/
• 关键词: Coherent light source; Narrow bandwidth; VUV; 2 photon resonant 4 wave; Nonlinear crystal; KBBF; F_2 laser; Lithography; チタンサファイアレーザー; 157nm光源

This project aims at the development of an inspection tool for F_2 laser lithography. For this purpose, the narrow bandwidth (<0.01pm), single mode, coherent light source was developed at the F_2 laser wavelength (157.6nm) by two methods, (1) 2-photon resonant, 4-wave mixing in gaseous Xe, (2) Second harmonic generation and sum frequency mixing in a nonlinear crystal KBBF.In the method (1), we developed single mode, Ti : sapphire lasers with the wavelengths of 768 and 681nm respectively.The 157.6-nm light was achieved by the mixing of 681 nm with the third harmonic of the 768-nm light which is in resonance to Xe6p[5/2, 2]. The obtained output power and spectral width were 0.6mW and 0.008pm, cleaning the target of this project. This light source was used to determine the instrumental function of the spectrometer for the characterization of F_2 laser in Gigaphoton inc.In the method (2) the optically contacted, prism-couple device was developed by a KBBF crystal supplied from Prof. Chen in Chinese Academy of Science.The 170-nm light was generated by the 4th harmonic of the above-mentioned Ti : sapphire laser (680nm). This wavelength is the shortest ever obtained by second harmonic generation (SHG). The quasi CW 177-nm light was achieved by SHG of a commercial 355-nm laser and is now being used for ultra high-resolution photoelectron spectroscopy.The 156-nm radiation was generated by the 5th harmonic of the Ti : sapphire laser tuned to 780nm. This wavelength is the shortest ever obtained by nonlinear crystals.The output power at 157.6nm was at a level of μ W.

本计画旨在研制一种适用于F_2雷射微影制程之检测工具。为此，窄带宽在F_2激光波长下，研制了单模（<0.01pm）相干光源（157.6nm）的二次谐波产生和混频。在（1）方法中，我们发展了单模Ti：蓝宝石激光器的波长分别为768和681 nm，157.6 nm的光是通过681 nm与768 nm光的三次谐波（与Xe6p共振）的混合获得的。获得的激光输出功率为0.6mW，光谱宽度为0.008pm，达到了本课题的目标。方法（2）采用中国科学院陈教授提供的KBBF晶体研制了光接触棱镜耦合装置，由上述钛宝石激光器的四次谐波（680nm）产生170nm的光。这个波长是二次谐波产生（SHG）所获得的最短波长。准连续177nm光是由商用355nm激光器的倍频产生的，现在被用于超高分辨光电子能谱。156nm辐射是由调谐到780nm的Ti：sapphire激光器的五次谐波产生的。在157.6nm处获得了μ W量级的激光输出。

项目成果

T.Sekikawa, T.Katsura, S.Watanabe: "Measurement of High Harmonic Pulses"レーザー研究. 30・9. 503-507 (2002)

T.Sekikawa、T.Katsura、S.Watanabe：“高次谐波脉冲的测量”激光研究 30・9 (2002)。

T.Sekikawa, T.Shimizu, S.Watanabe: "コヒーレント極限紫外光の物性研究への応用"光学. 32・3(掲載予定). (2003)

T.Sekikawa、T.Shimizu、S.Watanabe：“相干极紫外光在物理性质研究中的应用”光学32・3（待出版）。

T.Suganuma, H.Kubo, O.Wakabayashi, H.Mizoguchi, K.Nakao, Y.Nabekawa, T.Togashi, S.Watanabe: "157-nm coherent light source as an inspection tool for F_2 laser lithography"Optics Letters. 27・1. 46-48 (2002)

T.Suganuma、H.Kubo、O.Wakabayashi、H.Mizoguchi、K.Nakao、Y.Nabekawa、T.Togashi、S.Watanabe：“157 nm 相干光源作为 F_2 激光光刻的检查工具”Optics Letters .27・1.46-48 (2002)

T.Togashi, T.Kanai, T.Sekikawa, S.Watanabe, C.Chen, C.Zhang, Z.XU, J.Wang: "Generation of Vacuum-ultraviolet light by an optically contacted, prism-coupled KBe_2BO_3F_2 crystal"Optics Letters. 28・4. 254-256 (2003)

T.Togashi、T.Kanai、T.Sekikawa、S.Watanabe、C.Chen、C.Zhang、Z.XU、J.Wang：“通过光学接触、棱镜耦合的 KBe_2BO_3F_2 晶体产生真空紫外光”光学快报28・4。

T.Suganuma, et al.: "157-nm coherent light source as an inspection tool for F_2 laser lithography"Optics Letters. 27・1. 46-48 (2002)

T.Suganuma 等人：“157 nm 相干光源作为 F_2 激光光刻的检查工具”Optics Letters 27・1 (2002)。