Optimization of dielectric interfaces using nano structured surfaces

使用纳米结构表面优化介电界面

• 批准号: 461840646
• 负责人: Professor Dr. Andreas Fery
• 金额: --
• 依托单位: Institut Physikalische Chemie und Physik der Polymere
• 依托单位国家: 德国
• 项目类别: Research Grants
• 资助国家: 德国
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/461840646?language=en
• 关键词: Optimization; dielectric; interfaces; using; nano

In this research application, joints, bushing, and terminations with electrical potential separation (e.g. cable sleeves and terminations in medium to extra-high voltage technology) are to be improved concerning their electrical strength. Changes in the electrical behaviour of electrical insulation arrangements, which occur at interfaces based on different material properties, are known. In addition to the intended influence on this behaviour, surface roughness and assembly inaccuracies can cause cavities to form which, above a certain size, allows partial discharges, leading to damage in the insulating material and the interface. For this reason, these cavities should be designed to be as small as possible below the critical size of 10 µm. State of the art is gas permeable materials or other auxiliary materials such as pastes to close these potential cavities. The surface hardness as well as a suitable contact pressure are selected accordingly. Furthermore, preliminary investigations show that a specific surface structuring, e.g., by a triangular structure (100 µm), increases the interface length. The extension of this resulted in an expected increase in electrical strength.Objective: In the present project proposal, the targeted use of wrinkle structuring (wrinkling) using plasma modification is intended to generate required structural sizes (resulting in cavities below 10 µm) on the surface of longitudinal interface materials. This will be lead to an increase in the electrical interface strength and a reduce in the use of additional materials as well as a decrease in the component size.For this purpose, an elastic substrate is stretched and at the same time, a thin, solid film is applied or generated. The subsequent relaxation leads to a stress compromise between the thin, solid film and the elastic substrate. This causes local deformations of the film at the surface, resulting in a periodically sinusoidal wrinkle structure. In the case of uniaxial deformation, the wrinkles form perpendicular to the direction of elongation. The characteristic parameters are the wavelength and the structure height of the wrinkles, which can be precisely adjusted by the different plasma process parameters. Other structuring methods like lithography or laser structuring, which also allow structures in the desired size range, are too slow or too expensive or cannot be scaled to large areas or 3D geometries. Structuring by embossing or printing does not allow the desired size range. Wrinkle structuring, on the other hand, can be flexibly controlled via the manufacturing parameters and can be implemented in a large area and resource-efficiently. Also, the present project proposal aims to structure silicones, which is why in-situ plasma modification combined with controlled deformation of substrates for wrinkle formation is most promising.

在本研究应用中，接头、套管和具有电位隔离的终端（例如，中压至特高压技术中的电缆套管和终端）的电气强度将得到改善。电绝缘装置的电性能的变化是已知的，该变化发生在基于不同材料特性的界面处。除了对这种行为的预期影响外，表面粗糙度和组装不准确性可能导致空腔形成，超过一定尺寸，允许局部放电，导致绝缘材料和界面损坏。因此，这些空腔应设计得尽可能小，低于10 µm的临界尺寸。现有技术是气体可渗透材料或其他辅助材料，如糊剂，以封闭这些潜在的空腔。相应地选择表面硬度以及合适的接触压力。此外，初步研究表明，特定的表面结构，例如，通过三角形结构（100 µm），增加了界面长度。目的：在本项目提案中，使用等离子体改性的皱纹结构化（皱纹化）的目标是在纵向界面材料的表面上产生所需的结构尺寸（导致低于10 µm的空腔）。这将导致电界面强度的增加和附加材料的使用的减少以及元件尺寸的减小。为此，弹性基底被拉伸，同时，施加或产生薄的固体膜。随后的松弛导致薄的固体膜和弹性基底之间的应力折衷。这导致薄膜在表面处的局部变形，从而导致周期性正弦褶皱结构。在单轴变形的情况下，褶皱垂直于伸长方向形成。其特征参数为褶皱的波长和结构高度，可以通过不同的等离子体工艺参数进行精确调节。其他结构化方法，如光刻或激光结构化，也允许在所需的尺寸范围内的结构，太慢或太昂贵，或不能缩放到大面积或3D几何形状。通过压花或印刷的结构化不允许期望的尺寸范围。另一方面，褶皱结构化可以通过制造参数灵活地控制，并且可以在大面积和资源有效地实施。此外，目前的项目提案旨在结构化有机硅，这就是为什么原位等离子体改性结合可控变形的衬底皱纹形成是最有前途的。