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Spectro-ellipsometric Analysis of Periodically Structured Samples

周期性结构样品的光谱椭圆分析

基本信息

批准号：
15560031
负责人：
YAMAGUCHI Tomuo
金额：
$ 2.18万
依托单位：
Shizuoka University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2003
资助国家：
日本
起止时间：
2003 至 2006
项目状态：
已结题

项目摘要

1) Recent ultra fine structures in integrated circuits require new optical monitoring technology called optical scatterometry. In this research project, the scatterometry based on spectroscopic ellipsometry and also based on magneto-optic spectroscopy was applied to the analysis of periodically structured samples. In the theoretical calculations, coupled wave theory for gratings was introduced. Although integration circuits have a complicated structure, periodic structure is fabricated on a portion called teg for the monitoring of each lithography step.2) Results on the spectroscopic ellipsometry : Rectangular gratings with 250 nm period and 500 nm depth with various width ratio fabricated on a fused quartz substrate using an electron beam lithography and similar gratings with 130 nm period fabricated on a Si surface were analyzed and showed a good correspondence with cross sectional SEM images. Rectangular Ta wires fabricated on a fused quartz substrate required barreled cross section in the analysis and correspond well with SEM images. Two dimensionally distributed circular holes with 94 nm diameter, 180 nm pitch and 100 nm depth fabricated on a Si surface were analyzed by keeping lattice parameters. Values of the diameter and the depth correspond well with the SEM image of the cross section.3) Results on the magneto-optical spectroscopy: Nano-structures fabricated with ferromagnetic materials were analyzed. The magnetic nano-structure is aimed to monitor fabrication process of magneto-optic memory and magnetic random access memory (MRAM) and also aimed to study basic properties of magnetic nano-structure. They have anisotropic properties, so that optical response of magnetic nano-structure was summerized.

1)最近集成电路中的超精细结构需要新的光学监测技术，称为光学散射测量。在本研究项目中，基于椭圆偏振光谱的散射测量和基于磁光光谱的散射测量应用于周期性结构样品的分析。在理论计算中，引入了光栅的耦合波理论。虽然集成电路具有复杂的结构，但为了对每一次光刻进行监控，在被称为TIG的部分上制作了周期性结构。步骤2)椭圆偏振光谱测量结果：利用电子束光刻技术在熔融石英衬底上制作了周期为250 nm、深度为500 nm的不同宽度比的矩形光栅，并对在硅表面上制作的周期为130 nm的类似光栅进行了分析，结果与横截面扫描电子显微镜图像具有很好的一致性。在熔融石英衬底上制备的矩形钽丝在分析中需要桶形截面，并与扫描电子显微镜图像很好地对应。在保持晶格参数不变的情况下，分析了在硅表面上形成的直径为94 nm、间距为180 nm、深度为100 nm的两个二维分布的圆孔。直径和深度的大小与横截面的扫描电子显微镜图像吻合较好。3)磁光光谱研究结果：分析了铁磁材料制备的纳米结构。磁性纳米结构旨在监测磁光存储器和磁随机存取存储器(MRAM)的制备过程，并研究磁性纳米结构的基本性质。它们具有各向异性，因此总结了磁性纳米结构的光学响应。