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Up take and release characteristics of hydrogen isotopes in re-deposited layers on the plasma facing wall

等离子体面对壁上再沉积层中氢同位素的吸收和释放特性

基本信息

批准号：
16560720
负责人：
NAGATA Shinji
金额：
$ 2.37万
依托单位：
Tohoku University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2004
资助国家：
日本
起止时间：
2004 至 2005
项目状态：
已结题

项目摘要

In the present study, up-take, retention and release characteristics of hydrogen isotopes were studied on the W and Mo, which are promising candidates for plasma facing materials. W and Mo single crystalline disks were made by the floating zone melting method. As a simulation of the re-deposition layers, tungsten films were prepared by a conventional rf magnetron sputtering with a W target in defined Ar/O2 mixture, at a temperature range between 300 and 900 K. The micro structure of the deposited films strongly depended on the substrate temperature and oxygen concentration. The highly oriented films prepared at the substrate temperature above 800 K exhibit good gasochromic properties for hydrogen gas exposure. However, hydrogen retention was not significantly affected by the composition of oxides and the micro structure of the deposited layer. Hydrogen accumulation in W surface irradiated by noble gas ions was examined in connection with morphological and compositional changes. Remarkable hydrogen retention was found for the He and Xe ion implanted layers where blisters and exfoliation were created. Tungsten oxides such as WO2 were formed along projected ranges of the implanted ions. The results indicated that the porous oxide surface layers play an important role for dissociation of hydrogen, and hydrogen trapping is correlated with microstructural changes owing to the formation of bubbles and clusters of implanted noble gas atoms. Preferential up-take of H atoms was found in the He saturated layer, when the specimen was exposed to the atmosphere mainly containing D_2 and D_2O gas ; the up-take rate for H was an order of magnitude higher than that for D during D_2 gas exposure. The observed isotope effects on the up-take behavior might be due to the proton conductive oxides formed on the He irradiated surface of the W and Mo.

本文研究了氢同位素在面向等离子体材料W和Mo上的吸收、保留和释放特性。采用浮区熔炼法制备了W、Mo单晶片。在300~900K温度范围内，用射频磁控溅射W靶在一定的Ar/O2混合气体中制备了钨薄膜作为再淀积层的模拟。薄膜的微观结构强烈依赖于衬底温度和氧气浓度。在800K以上的衬底温度下制备的高取向薄膜具有良好的气致变色性能。然而，氧化物的组成和沉积层的微观结构对氢的保持率没有显著影响。研究了稀有气体离子辐照下钨表面的氢积累与表面形貌和成分变化的关系。在产生气泡和剥落的He和Xe离子注入层中发现了显著的氢保持。像WO2这样的钨氧化物是沿着注入离子的投影范围形成的。结果表明，多孔氧化物表面层对氢的解离起着重要作用，氢捕获与注入惰性气体原子形成气泡和团簇的微观结构变化有关。当样品暴露在主要含有D_2和D_2O气体的大气中时，H原子在氦饱和层中优先吸收，在D_2气体暴露过程中，H原子的吸收速率比D高一个数量级。观察到的同位素效应可能是由于在He辐照的W和Mo表面形成了质子导电氧化物。

项目成果

期刊论文数量（21）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Compatibility of Lithium Oxide Single Crystals with Tungsten Sputtered Films.

氧化锂单晶与钨溅射薄膜的相容性。

DOI：
发表时间：
2005
期刊：
J.Jpn.Soc.Powder Powder Metallurgy 52(6)
影响因子：
0
作者：
Y.Nakamura;S.Matsumoto;et al.;中村裕一他3名の共著;T.Norimatsu;プラズマ核融合学会偏;プラズマ核融合学会編;A.Inouye et al.;B.Tsuchiya ほか;A.Inouye ほか;S.Nasu et al.
通讯作者：
S.Nasu et al.

Gasochromic Property of Oriented Tungsten Oxide Thin Film

定向氧化钨薄膜的气致变色性能

DOI：
发表时间：
2006
期刊：
Transactions of the Materials Research Society of Japan 31
影响因子：
0
作者：
Y.Nakamura;S.Matsumoto;et al.;中村裕一他3名の共著;T.Norimatsu;プラズマ核融合学会偏;プラズマ核融合学会編;A.Inouye et al.
通讯作者：
A.Inouye et al.

Effects of Ion Beam Modification on Absorption and Transport of Hydrogen in Perovskite-Type Oxide Ceramics

离子束改性对钙钛矿型氧化物陶瓷氢吸收和传输的影响

DOI：
发表时间：
2005
期刊：
Nuclear Instruments and Methods in Physics Research (印刷中)
影响因子：
0
作者：
K.Kuroda;S.Nakamoto;R.Ichino;M.Okido;R.M.Pilliar;B.Tsuchiya;B.Tsuchiya;B.Tsuchiya;B.Tsuchiya;B.Tsuchiya;B.Tsuchiya;B.Tsuchiya
通讯作者：
B.Tsuchiya

The effect of co-deposition of hydrogen and metals on wall pumping in long duration plasma in TRIAM-1M

TRIAM-1M 中氢和金属共沉积对长持续等离子体壁泵浦的影响

DOI：
发表时间：
2005
期刊：
Journal of Nuclear Materials 337-339
影响因子：
0
作者：
Y.Nakamura;S.Matsumoto;et al.;中村裕一他3名の共著;T.Norimatsu;プラズマ核融合学会偏;プラズマ核融合学会編;A.Inouye et al.;B.Tsuchiya ほか;A.Inouye ほか;S.Nasu et al.;M.Miyamoto et al.
通讯作者：
M.Miyamoto et al.

Effects of hydrogen and hydroxyl on ion beam induced luminescence of ceramics

氢和羟基对陶瓷离子束诱导发光的影响

DOI：
发表时间：
2005
期刊：
JAERI-Review 2005-001
影响因子：
0
作者：
Y.Nakamura;S.Matsumoto;et al.;中村裕一他3名の共著;T.Norimatsu;プラズマ核融合学会偏;プラズマ核融合学会編;A.Inouye et al.;B.Tsuchiya ほか;A.Inouye ほか;S.Nasu et al.;M.Miyamoto et al.;S.Nagata et al.
通讯作者：
S.Nagata et al.