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Hydrogen retention and release dynamics in tungsten oxide layers with various structure and elemental composition

不同结构和元素组成的氧化钨层中氢的保留和释放动力学

基本信息

批准号：
18560789
负责人：
NAGATA Shinji
金额：
$ 2.49万
依托单位：
Tohoku University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2006
资助国家：
日本
起止时间：
2006 至 2007
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-18560789/
关键词：
plasma facing materials re-deposited layer sputtering tungsten hydrogen isotopes oxides ion irradiation optical properties

项目摘要

Tungsten oxide thin films were deposited on a SiO_2, U or St Substrates by Kt magnetron sputtering wan a pure metal W target, and by ArF - PLD using a W03 target. The substrate temperature during the deposition was varied in a range between 300 and 800 K. A mixture of argon and oxygen gases was introduced into a deposition chamber and adjusted by a mass-flow controller. The thickness of the deposited films was about 500 run. The crystal structure and microstructure of films were examined by X-ray diffractometry and by transmission electron microscopy. The composition of W and 0 in the film was determined by Rutherford Backscattering Spectroscopy (RBS). The concentration depth profiles of hydrogen were measured by the Elastic Recoil Detection Analysis (ERDA) technique. The optical absorption of the film in wavelength between 200 and 900 urn was simultaneously measured in a scattering chamber using a monochrometer equipped with CCD camera.At room temperature, poly-crystals of beta-tungsten (A-15 type structure) were formed without supplying the oxygen gas for both deposition methods. With increasing the oxygen, the long range order of the beta-tungsten was initially lost. Then an amorphous phase of W03 appeared under sufficient oxygen pressure. The ERD measurements revealed that the hydrogen atoms were uniformly distributed in the W03 film with a concentration as high as H/W = 0.7. The incorporation of hydrogen during the H2 gas exposure supports the double injection model of the gasochromic process, in which the dissolved protons. play a role for reducing Wt. During the heat treatment in a high vacuum, thermal release of hydrogen from the HxWO_3 film was completed at about 600 K, accompanied by the coloration of the film, indicating the reduction of W6 and release of H20 from the surface. The thermal release behavior of hydrogen in air atmosphere was the same as that in the vacuum, whereas the coloration of the film was suppressed.

用Kt磁控溅射法和ArF-PLD法分别在SiO_2、U和St基片上制备了氧化钨薄膜。沉积期间的衬底温度在300和800 K之间的范围内变化。将氩气和氧气的混合物引入沉积室中，并通过质量流量控制器进行调节。沉积膜的厚度为约500 nm。用X射线衍射仪和透射电子显微镜分析了薄膜的晶体结构和微观结构。用卢瑟福背散射光谱仪（RBS）测定了薄膜中W和O的组成。采用弹性反冲探测分析（ERDA）技术测量了氢的浓度深度分布。在散射室中用装有CCD摄像机的单色仪同时测量了薄膜在200 ~ 900 μ m波长范围内的光吸收。在室温下，两种沉积方法都在不提供氧气的情况下形成了β-钨多晶（A-15型结构）。随着氧含量的增加，β-钨的长程有序性开始丧失。然后，在足够的氧气压力下出现非晶相的W 〇 3。ERD测量显示，氢原子均匀地分布在WO 3膜中，浓度高达H/W = 0.7。在H2气体暴露期间并入氢支持气致变色过程的双注入模型，其中溶解的质子。起到降低Wt的作用。在高真空热处理过程中，HxWO_3薄膜在600 K左右完全热释氢，并伴随着薄膜的着色，表明W_6的还原和H_2O从表面的释放。氢气在空气气氛中的热释放行为与真空中相同，但薄膜的着色得到抑制。

项目成果

期刊论文数量（0）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Hydrogen behavior in tungsten oxide layer deposited by RF plasma and PLD

RF 等离子体和 PLD 沉积的氧化钨层中的氢行为

DOI：
发表时间：
2007
期刊：
影响因子：
0
作者：
A. Inouye;S. Yamamoto;S. Nagataほか;S.Nagata ほか;永田晋二;井上愛知;山本春也;S. Yamamoto;永田晋二;永田晋二;S. Nagata
通讯作者：
S. Nagata

Hydrogen incorporation tungsten oxide films deposited by RF plasma

射频等离子体沉积的掺氢氧化钨薄膜

DOI：
发表时间：
2007
期刊：
影响因子：
0
作者：
A. Inouye;S. Yamamoto;S. Nagataほか;S.Nagata ほか;永田晋二;井上愛知
通讯作者：
井上愛知

Gasochromic Coloration of Non-stoichiometric WO_<3-x> Films

非化学计量WO_<3-x>薄膜的气致变色

DOI：
发表时间：
2007
期刊：
Transactions of the Materials Research Society of Japan 32
影响因子：
0
作者：
A. Inouye;S. Yamamoto;S. Nagata ほか
通讯作者：
S. Nagata ほか

Hydrogen Retention Properties of Co-Deposition under High Density Plasmas in TRIAM-1M

TRIAM-1M 高密度等离子体共沉积的氢保留性能

DOI：
发表时间：
2005
期刊：
Proc.12nd International Conference on Fusion Reactor Materials
影响因子：
0
作者：
K.Hanada;T.Sugata;M.Sakamoto;et al.;M.Miyamoto et al.;H.Zushi et al.;H.Zushi et al.;M.Sakamoto et al.;M.Tokitani et al.
通讯作者：
M.Tokitani et al.

Retention properties of plasma particles in tungsten exposed to LHD divertor

暴露于 LHD 偏滤器的钨中等离子体粒子的保留特性