The generating of a functional film by multiply nitriding of aluminum using the In situ reduction reaction.
The generating of a functional film by multiply nitriding of aluminum using the In situ reduction reaction.
批准号:
17560643
负责人:
OKUMIYA Masahiro
金额:
$2.3万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2006
中文摘要
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英文摘要
An Aluminum (Al) has been interested as a material for lightning such as automotive or machine parts. However, it is not applicable in sliding parts since the hardness and wear resistance of Al are respectively inferior to steel. In previous study, an aluminum nitride (AlN) layer was formed in nitrogen atmosphere using the commercial glade pure Al (JIS-A1050) below the melting point of Al in barrel which was loosely filled with average diameter 0.1 mm alumina powder and average diameter 0.2 mm aluminum-magnesium alloy powder for activating the Al substrate surface chemically and/or physically. In this study, the mechanism of formation of AlN layer in barrel was examined and the hardness of modified layer was controlled using ion nitriding with barrel nitriding.Before the Al is nitrided, the incubation period exists. In this period, at the cross section near the surface the white region is observed by the optical micro scope and also the existence of magnesium (Mg) is observed by Electr … More on Probe Micro Analyzer (EPMA). It seems that Mg is infiltrated and diffused from the filled Al-Mg alloy powder in barrel. After this step, the AlN is partially generated at the surface of Al substrate, it grows even with substrate surface. The AlN layer thickness increases proportionally to the root of nitriding time in barrel. After the barrel nitriding, the ion nitriding was combined for some specimens. In the combined processes, the thickness of the modified layer is less than that obtained by barrel nitriding alone. By choosing the ratio of the barrel nitriding period and the ion nitriding period, the hardness of the modified layer can be controlled in respect.In order to identify the diffusion species in the nitride layer, φ0.8 mm zirconia (ZrO_2) wire was used as a marker. The wire was squeezed into the surface of Al substrate with a hand press. There are three possible wire positions after nitriding. First, (a) if the nitrogen diffuses to the nitride layer, the marker wire will stay on nitride surface, second, (b) if the Al diffuses to the nitride layer, it will wander between the nitride layer and the substrate, third, (c) both nitrogen and Al diffuse then the marker will reside in the nitride layer. By the cross sectional optical micrographs of the substrate before and after nitriding, the marker is stay on the surface of nitride layer, therefore we can see that the nitride layer grows by nitrogen diffusion into the nitride layer. Less
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Nitriding of Aluminum Alloy by Electron Beam Excited Plasma
电子束激发等离子体渗氮铝合金
DOI:
--
发表时间:
2006
期刊:
Jap.J.Heat Treatment Soc vol.46, No.2
影响因子:
--
作者:
[M.Okumiya, Y.Tsunekawa, A.Baba, S.Tamura]
通讯作者:
S.Tamura
電子ビーム励起プラズマによるアルミニウム合金の表面窒化
电子束激发等离子体铝合金表面渗氮
DOI:
--
发表时间:
2006
期刊:
熱処理 第46巻,第2号
影响因子:
--
作者:
[奥宮正洋, 恒川好樹, 馬場昭弘, 田村 賢]
通讯作者:
田村 賢
DOI:
--
发表时间:
2006
期刊:
Solid State Phenomena 118
影响因子:
--
作者:
[M.Okumiya, H.Ikeda, Y.Tsunekawa]
通讯作者:
Y.Tsunekawa
Fabrication of Highly Adhesive Grits Abrasive Wheels by Electroless Composite Plating with Ultrasonic Vibration
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批准号:14550715
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.3万
-
财政年份:2002
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负责人:OKUMIYA Masahiro
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依托单位:
Development in novel electroless plating of compositionally graded coating with high deposition rate
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批准号:11650752
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资助金额:$2.3万
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财政年份:1999
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负责人:OKUMIYA Masahiro
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依托单位:
Research on Incorporation Process by Electromagnetic Melt Stirring Based on Interface Control with Ultrasound
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批准号:08555180
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$12.42万
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财政年份:1996
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负责人:OKUMIYA Masahiro
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依托单位:
国内基金
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基于CRISPR Activation转录激活系统的籼稻新型再生因子的挖掘
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批准号:32301275
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项目类别:青年科学基金项目
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资助金额:30万元
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批准年份:2023
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负责人:陈璐
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炎性反应中巨噬细胞激活诱导死亡(activation-induced cell death,AICD)的机理研究
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项目类别:重点项目
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资助金额:105.0万元
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批准年份:2003
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负责人:顾军
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依托单位: