New spatial atomic layer deposition precursors and plasma processes towards functional materials for advanced applications

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The present project proposes to develop and study new metalorganic precursors and plasma processes, specially designed for Spatial Atomic Layer Deposition (SALD). In particular, new Ag, Cu and Ga precursors will be synthesized, and innovative atmospheric nitrogen plasma assisted SALD processes will be developed. The new precursors and processes will be used to prepare nanomaterials not yet deposited by SALD, namely, AgCuO2, β-Ga2O3, CuGaO2 as well as different oxynitrides (TiNO, AlON). These nanomaterials will be then applied as active components in different optoelectronic materials and devices, such as composite transparent conductive electrodes and all-oxide solar cells.