In situ atomic-scale studies of the mechanisms and dynamics of bismuth and cobalt electrodeposition by Video-STM

通过 Video-STM 对铋和钴电沉积的机理和动力学进行原位原子尺度研究

• 批准号: 50991676
• 负责人: Dr. Hisayoshi Matsushima
• 金额: --
• 依托单位: Institut für Experimentelle und Angewandte Physik
• 依托单位国家: 德国
• 项目类别: Research Fellowships
• 财政年份: 2007
• 资助国家: 德国
• 起止时间: 2006-12-31 至 2009-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/50991676?language=en
• 关键词: situ; atomic; scale; studies; mechanisms

The aim of the proposed research is to clarify the mechanisms and dynamics of the anisotropic (“needle-like”) electrochemical growth of bismuth and cobalt on Au(111) by in-situ high-speed scanning tunnelling microscopy (Video-STM). In both systems the nucleation and shape evolution of the deposit islands will be studied at high time resolution. The studies of Co electrodeposition will focus on the growth of the initial two layers, specifically on the influence of the Au(111) reconstruction on the growth behaviour. Bi growth will be studied from the underpotential deposition (UPD) regime to the epitaxial growth at overpotentials.

本研究的目的是利用高速扫描隧道显微镜（Video-STM）原位研究铋和钴在Au（111）表面各向异性（“针状”）电化学生长的机制和动力学。在这两个系统的成核和形状演变的存款岛将在高时间分辨率进行研究。Co电沉积的研究将集中在最初两层的生长，特别是Au（111）重构对生长行为的影响。将研究从欠电位沉积（UPD）状态到过电位外延生长的Bi生长。