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An in-situ LEIS facility for atomic-scale assembly manufacturing research

An in-situ LEIS facility for atomic-scale assembly manufacturing research
用于原子级组装制造研究的原位 LEIS 设施
批准号:
EP/P001297/1
负责人:
Paul Chalker
金额:
$53.11万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2016
资助国家:
英国
项目状态:
已结题
起止时间:
2016 至 --

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中文摘要
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英文摘要
Our everyday lives are so enriched by technology, that it is becoming unimaginable to live without it. We are supported by an energy infrastructure; information technology; and modern healthcare for example. All of these impact on us through products which involve advanced manufacturing processing at surfaces and interfaces. Manufacturing involves additive assembly, subtractive removal, heat treatments and chemical processes. All together this technology brings us smart phones, computers, solar cells, medical devices, automobiles and so many more.The goal of this project is to develop at tool for examining the surfaces of parts during manufacturing processes or exposure to reactive environments. We will use beams of low energy ions to inform us about the atomic structure of surfaces and interfaces in materials, in between exposing them to simulated process environments. The technique of Low Energy Ion Scattering (LEIS) will be combined with a processing chamber, which will allow samples to be treated and then intermittently characterised without exposing the surface to atmosphere. Through repeated cycles of treatment and characterisation, 'snap shots' of the evolving surface structure will reveal what atomic scale mechanisms are occurring during processing. This approach will lead to improved manufacturing methods and ultimately to better products of the future. This project will design, procure and implement a unique in-situ LEIS facility, that will enhance a broad portfolio of existing and future EPSRC research across the UK and internationally through collaboration.
期刊论文(3)
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会议论文
Nb-doped TiO2 coatings developed by high power impulse magnetron sputtering-chemical vapor deposition hybrid deposition process
高功率脉冲磁控溅射-化学气相沉积混合沉积工艺开发的掺铌TiO2涂层
DOI: 10.1116/6.0000118
发表时间: 2020
期刊: Vacuum, Surfaces, and Films
影响因子: --
作者: [Kulczyk-Malecka J]
通讯作者: Kulczyk-Malecka J
DOI: 10.1016/j.mtla.2020.100590
发表时间: 2020-01
期刊: Materialia
影响因子: 3.4
作者: [X. Garmendia;S. Chalker;Matthew Bilton;C. Sutcliffe;P. Chalker]
通讯作者: X. Garmendia;S. Chalker;Matthew Bilton;C. Sutcliffe;P. Chalker
Elucidation of ALD MgZnO deposition processes using low energy ion scattering
使用低能离子散射阐明 ALD MgZnO 沉积过程
DOI: 10.1116/1.5015958
发表时间: 2018
期刊: Vacuum, Surfaces, and Films
影响因子: --
作者: [Werner M]
通讯作者: Werner M
HiPIMS-CVD Hybrid Process for Advanced Functional Coatings: Proof of concept
  • 批准号:
    EP/N031687/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $24.46万
  • 财政年份:
    2016
  • 负责人:
    Paul Chalker
  • 依托单位:
Manufacturing with Light 2: photochemical ALD to manufacture functional thin films
  • 批准号:
    EP/N017773/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $78.02万
  • 财政年份:
    2015
  • 负责人:
    Paul Chalker
  • 依托单位:
Mechanisms and Control of Resistive Switching in Dielectrics
  • 批准号:
    EP/M00662X/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $63.73万
  • 财政年份:
    2015
  • 负责人:
    Paul Chalker
  • 依托单位:
Manufacturing with Light - photochemical ALD to manufacture functional thin films
  • 批准号:
    EP/L02201X/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $25.54万
  • 财政年份:
    2014
  • 负责人:
    Paul Chalker
  • 依托单位:
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