课题基金 / 基金详情

An in-situ LEIS facility for atomic-scale assembly manufacturing research

An in-situ LEIS facility for atomic-scale assembly manufacturing research
用于原子级组装制造研究的原位 LEIS 设施
批准号:
EP/P001297/1
负责人:
Paul Chalker
金额:
$53.11万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2016
资助国家:
英国
项目状态:
已结题
起止时间:
2016 至 --

项目摘要

项目成果

Paul Chalker的其他基金

相似基金

相关文献

中文摘要
翻译
我们的日常生活因技术而变得如此丰富,以至于没有它就无法想象。例如,我们得到能源基础设施、信息技术和现代医疗保健的支持。所有这些都通过涉及表面和界面先进制造工艺的产品对我们产生影响。制造涉及添加组装、减材移除、热处理和化学工艺。这项技术为我们带来了智能手机、电脑、太阳能电池、医疗设备、汽车等。该项目的目标是开发一种工具,用于在制造过程中或暴露于反应环境中检查零件的表面。我们将使用低能离子束来告知我们材料表面和界面的原子结构,在将它们暴露于模拟工艺环境之间。低能离子散射(LEIS)技术将与处理室相结合,这将允许对样品进行处理,然后在不将表面暴露于大气的情况下进行间歇性表征。通过反复循环的处理和表征,不断变化的表面结构的“快照”将揭示加工过程中发生的原子尺度机制。这种方法将导致改进的制造方法,并最终导致未来更好的产品。该项目将设计,采购和实施一个独特的现场LEIS设施,这将通过合作增强整个英国和国际上现有和未来EPSRC研究的广泛组合。
英文摘要
Our everyday lives are so enriched by technology, that it is becoming unimaginable to live without it. We are supported by an energy infrastructure; information technology; and modern healthcare for example. All of these impact on us through products which involve advanced manufacturing processing at surfaces and interfaces. Manufacturing involves additive assembly, subtractive removal, heat treatments and chemical processes. All together this technology brings us smart phones, computers, solar cells, medical devices, automobiles and so many more.The goal of this project is to develop at tool for examining the surfaces of parts during manufacturing processes or exposure to reactive environments. We will use beams of low energy ions to inform us about the atomic structure of surfaces and interfaces in materials, in between exposing them to simulated process environments. The technique of Low Energy Ion Scattering (LEIS) will be combined with a processing chamber, which will allow samples to be treated and then intermittently characterised without exposing the surface to atmosphere. Through repeated cycles of treatment and characterisation, 'snap shots' of the evolving surface structure will reveal what atomic scale mechanisms are occurring during processing. This approach will lead to improved manufacturing methods and ultimately to better products of the future. This project will design, procure and implement a unique in-situ LEIS facility, that will enhance a broad portfolio of existing and future EPSRC research across the UK and internationally through collaboration.
期刊论文(3)
专著(0)
科研奖励(0)
会议论文
Nb-doped TiO2 coatings developed by high power impulse magnetron sputtering-chemical vapor deposition hybrid deposition process
高功率脉冲磁控溅射-化学气相沉积混合沉积工艺开发的掺铌TiO2涂层
DOI: 10.1116/6.0000118
发表时间: 2020
期刊: Vacuum, Surfaces, and Films
影响因子: --
作者: [Kulczyk-Malecka J]
通讯作者: Kulczyk-Malecka J
DOI: 10.1016/j.mtla.2020.100590
发表时间: 2020-01
期刊: Materialia
影响因子: 3.4
作者: [X. Garmendia;S. Chalker;Matthew Bilton;C. Sutcliffe;P. Chalker]
通讯作者: X. Garmendia;S. Chalker;Matthew Bilton;C. Sutcliffe;P. Chalker
Elucidation of ALD MgZnO deposition processes using low energy ion scattering
使用低能离子散射阐明 ALD MgZnO 沉积过程
DOI: 10.1116/1.5015958
发表时间: 2018
期刊: Vacuum, Surfaces, and Films
影响因子: --
作者: [Werner M]
通讯作者: Werner M
HiPIMS-CVD Hybrid Process for Advanced Functional Coatings: Proof of concept
  • 批准号:
    EP/N031687/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $24.46万
  • 财政年份:
    2016
  • 负责人:
    Paul Chalker
  • 依托单位:
Manufacturing with Light 2: photochemical ALD to manufacture functional thin films
  • 批准号:
    EP/N017773/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $78.02万
  • 财政年份:
    2015
  • 负责人:
    Paul Chalker
  • 依托单位:
Mechanisms and Control of Resistive Switching in Dielectrics
  • 批准号:
    EP/M00662X/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $63.73万
  • 财政年份:
    2015
  • 负责人:
    Paul Chalker
  • 依托单位:
Manufacturing with Light - photochemical ALD to manufacture functional thin films
  • 批准号:
    EP/L02201X/1
  • 项目类别:
    Research Grant
  • 资助金额:
    $25.54万
  • 财政年份:
    2014
  • 负责人:
    Paul Chalker
  • 依托单位:
海外基金