CONTRIBUTION OF FLOATING BONDS TO LIGHT-INDUCED DEGRADATION OF HYDROGENATED AMORPHOUS SILICON
CONTRIBUTION OF FLOATING BONDS TO LIGHT-INDUCED DEGRADATION OF HYDROGENATED AMORPHOUS SILICON
批准号:
09650010
负责人:
KUMEDA Minoru
金额:
$2.11万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
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英文摘要
Relation between the randomeness of amorphous network and the creation of defects was first investigated in an amorphous system of a-Ge_<1-x> C_x : H films which contains constituent atoms with largely different covalent radii, and compared the results with those in a-Ge_<1-x>Si_x, : H films which contains constituent atoms with close covalent radii. It. was found that the addition of C atoms makes the films stricture more random and increase the Ge dangling bonds per Ge atoms.Next we measured the spin-lattice relaxation time T_1 of Si dangling bonds and its dependence on the light-soaking time in a-Si : H.It was found that T_1 has a fairly good correlation with the randomness of the amorphous network estimated from the Urbach energy. It was also found that T_1's for the broad and narrow component signals of the light-induced ESR decreases by light-soaking, in contrast to that for the dark component. This might be an important clue to judge whether the origin of the broad component of the light-induced ESR comes from the floating bonds.Finally we tried to explain the defect creation processes by the light-soaking and electron-beam irradiation, using rate equations based on a model in which the floating bonds contribute to create dangling bonds.
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M.Kumeda, T.Ryuda and T.Shimizu: "Rate equation for creation and annihilation of metastable defects in a-Si : H (in Japanese)" Proc.Annual Meet.of Jpn.Soc.Appl.Phys., Noda, March. 29p-YD-2 (1998)
M.Kumeda、T.Ryuda 和 T.Shimizu:“a-Si 中亚稳态缺陷的产生和消除的速率方程:H(日语)”Proc.Annual Meet.of Jpn.Soc.Appl.Phys.、Noda,
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M.KUMEDA, A.MASUDA and T.SHIMIZU: "Structural Studies on Hydrogenated Amorphaus Germanium-Carbon Films Prepared by RF Sputtering" Jpn.J.Appl.Phys.37・4(発表予定). (1998)
M.KUMEDA、A.MASUDA 和 T.SHIMIZU:“通过射频溅射制备氢化非晶锗碳薄膜的结构研究”Jpn.J.Appl.Phys.37・4(待发表)。
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M.Kumeda, A.Masuda and T.Shimizu: "Structural studies on hydrogenatedred amorphous germanium-carbon films prepa by rf sputtering" Jpn.J.Appl.Phys.Vol.34, No.4. 1754-1759 (1998)
M.Kumeda、A.Masuda 和 T.Shimizu:“通过射频溅射制备氢化红色非晶锗碳薄膜的结构研究”Jpn.J.Appl.Phys.Vol.34,No.4。
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立田哲夫,本田 聡,竹橋由浩,久米田 稔,清水立生: "電子線照射による水素化アモルファス シリコンの欠陥生成(II)" 平成10年度日本物理学会・応用物理学会北陸・信越支部合同講演会 講演予稿集. 43-43 (1998)
Tetsuo Tateta、Satoshi Honda、Yoshihiro Takehashi、Minoru Kumeda、Tatsuo Shimizu:“电子束照射在氢化非晶硅中的缺陷生成(II)”在1998年日本物理学会和北陆信越分会联席会议上的演讲应用物理学会会刊 43-43 (1998)。
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T.SHIMIZU,K.KATA,M.HITANI and M.KUMEDA: "Change of Spin-Lattice Relaxation Time with Light Soaking for Detects in Hydrogenated Amorphous Silicon" Jpn.J.Appl.Phys.37・10. 5470-5473 (1998)
T.SHIMIZU、K.KATA、M.HITANI 和 M.KUMEDA:“氢化非晶硅检测中自旋晶格弛豫时间的变化”Jpn.J.Appl.Phys.37・10( 1998)
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共 10 条
Role of dangling bonds for the photoluminescence of Er doped in a-Si : H
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批准号:16560005
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.92万
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财政年份:2004
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负责人:KUMEDA Minoru
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依托单位: