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Physics of contact interface of electron emission devices for display

Physics of contact interface of electron emission devices for display
显示用电子发射器件接触界面物理
批准号:
09650030
负责人:
KOIDE Yasuo
金额:
$2.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998

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中文摘要
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英文摘要
A semiconducting diamond is a potential element of the electron emitters with high efficiency, because the diamond was reported to have negative or small positive electron affinity, which is advantageous for enhancing the emission efficiency. In order to increase the efficiency, many factors which affect the efficiency must be improved. The effects of surface morphology on the field emission properties of non-doped polycrystalline diamond films with thicknesses ranging from 5 to 55 μm were studied. Diamond films grown by a microwave plasma chemical vapor deposition technique had both the diamond and non-diamond components with pyramidal and angular crystalline structures. Although the average crystallite size increased with increasing the film thickness (d), the volume fraction of the non-diamond components in the films was insensitive to the film thickness. However, the turn-on electric field, FィイD2TィエD2, (defined as the low-end electric field to emit electrons) showed a U-shape dependence on the film thickness. This U-shape dependence was explained by a model in which the emission current was controlled by the resistance at surface of the pyramids when d was thinner than 20 μm and by the resistance in the diamond film when d was thicker than 20 μm. The lowest field of 4 V/μm was obtained in the film with 20 μm thick.
期刊论文(11)
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会议论文
Y. Koide, T. Toyama, and M. Murakami: "Field Emission Characteristics of Non-doped Polycrystalline Diamond Films Synthesized by MPCVD"Diamond Films and Technology. vol.8, No.6. 407-413 (1998)
Y. Koide、T. Toyama 和 M. Murakami:“MPCVD 合成的非掺杂多晶金刚石薄膜的场发射特性”金刚石薄膜和技术。
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通讯作者:
Masatsugu Itahashi: "Field Emission Properties of B-doped p-Diamond Films Grown by Microwave-plisma chemical vapor deposition"J.Vac.Sci & Technol. (予定). (2000)
Masatsugu Itahashi:“通过微波等离子体化学气相沉积生长的 B 掺杂 p 金刚石薄膜的场发射特性”J.Vac.Sci & Technol(计划)。
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通讯作者:
Takuma Asari: "Field Emission Properties of Diamond-like-carbon Films Grown by microwave plasma chemical Vapor-Deposition"J.Vac.Sci & Technol. (予定). (2000)
Takuma Asari:“通过微波等离子体化学气相沉积生长的类金刚石碳薄膜的场发射特性”J.Vac.Sci & Technol(计划)。
DOI: --
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通讯作者:
Takuma Asari: "Reliability for Field E mission Properties of Diamond Films Grown by Microwave plasma chemical vapor-deposition"J.Vac.Sci & Technol. (予定). (2000)
Takuma Asari:“微波等离子体化学气相沉积生长的金刚石薄膜的场发射特性的可靠性”J.Vac.Sci & Technol(计划)。
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通讯作者:
11
    Preparation of guideline for sensing deep ultra-violet light using metal/diamond interfaces
    • 批准号:
      18360341
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.74万
    • 财政年份:
      2006
    • 负责人:
      KOIDE Yasuo
    • 依托单位:
    Development of highly-sensitive ultraviolet sensing method using diamond
    海外基金