Deposition of Ultra Fine Aerosol Particles on Solid Surfaces

超细气溶胶颗粒在固体表面上的沉积

基本信息

  • 批准号:
    62550692
  • 负责人:
  • 金额:
    $ 1.22万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
  • 财政年份:
    1987
  • 资助国家:
    日本
  • 起止时间:
    1987 至 1988
  • 项目状态:
    已结题

项目摘要

Deposition of submicron particles in the manufacturing process of semiconductors is one of the main causes of reducing production yield. In order to suppress particle deposition onto the surface of various materials, the deposition mechanisms of submicron particles have to be well understood. In the present work, first, by using circular tubes made of various materials, deposition of particles in various charging states was experimentally investigated. The tube materials studied were copper, glass, polymethylmetacrylate(PMMA), polyvinylchloride(PVC), pllycarbonate(PC), and polyethylene (PE). As a result it was found that 1) uncharged particle deposits by Brownian diffusion in all the tubes studies; 2) charged particle deposits in PMMA, PVC, PC and PE tubes by coulombic force, and that the dimensionless deposition velocity is equal to the coulombic force parameter derived for charged particle and charged infinite flat surface. Further, from the measurement of time dependency of particle … More penetration, decay of triboelectric charged on PVC and PC tubes was found to obey the law of hyperbolic decay. Secondly, experimental technique to measure deposition velocity onto wafer for particles with a diameter smaller than 0.3 m was developed by means of fluorometry. Employing the proposed technique, the deposition velocity onto the wafer was measured for charge equilibrium particles and singly charged particles with diameter between 0.03 and 0.8 m at airflow velocity of 0.02-0.5m/s. The measured deposition velocity was compared with that predicted by Liu and Ahn's equation. As a result, it was found that the Lie and Ahn's equation gives a good prediction for particles in the size range between 0.03 and 0.8 m, and , when both the wafer and the particles are charged, the deposition velocity is well estimated by adding the coulombic drift velocity to their equation. Further, through the measurement of the local deposition velocity on the wafer placed normal to the airflow, the deposition hot spots were found to appear on the edge of the wafer and/or at the center of the wafer, depending on the blockage of the wafer to the airflow. Less
在半导体制造过程中,亚微米颗粒的沉积是降低生产良率的主要原因之一。为了抑制颗粒在各种材料表面上的沉积,必须很好地理解亚微米颗粒的沉积机理。在本工作中,首先,通过使用由各种材料制成的圆管,在各种充电状态下的粒子的沉积进行了实验研究。所研究的管材料为铜、玻璃、聚甲基丙烯酸甲酯(PMMA)、聚氯乙烯(PVC)、聚碳酸酯(PC)和聚乙烯(PE)。结果表明:(1)不带电粒子在所研究的所有管中均以布朗扩散方式沉积;(2)带电粒子在PMMA、PVC、PC和PE管中以库仑力方式沉积,且无量纲沉积速度等于带电粒子和带电无限大平面的库仑力参数。此外,根据粒子的时间依赖性的测量, ...更多信息 发现PVC和PC管上摩擦电电荷的渗透、衰减遵循双曲线衰减规律。其次,发展了用荧光法测量直径小于0.3 μ m的颗粒在硅片上沉积速度的实验技术。采用所提出的技术,在0.02-0.5m/s的气流速度下,测量了直径在0.03 - 0.8m之间的电荷平衡颗粒和单电荷颗粒在晶片上的沉积速度。将实测沉积速度与Liu和Ahn方程预测的沉积速度进行了比较。结果发现,Lie和Ahn的方程给出了一个很好的预测颗粒的尺寸范围在0.03和0.8 μ m之间,并且,当晶片和颗粒都带电时,沉积速度很好地估计通过添加库仑漂移速度到他们的方程。此外,通过测量垂直于气流放置的晶片上的局部沉积速度,发现沉积热点出现在晶片的边缘和/或晶片的中心,这取决于晶片对气流的阻挡。少

项目成果

期刊论文数量(2)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
江見準 他: エアロゾル研究. 2. 304-311 (1987)
Jun Emi 等人:气溶胶研究 2. 304-311 (1987)
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

数据更新时间:{{ journalArticles.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ monograph.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ sciAawards.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ conferencePapers.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ patent.updateTime }}

KANAOKA Chikao其他文献

KANAOKA Chikao的其他文献

{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

{{ truncateString('KANAOKA Chikao', 18)}}的其他基金

Development of Controlling Technologies of Indoor Air Environment in Highly Airtight and Insulated Living Space
高密闭隔热居住空间室内空气环境控制技术的发展
  • 批准号:
    10650585
  • 财政年份:
    1998
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Development of High Performance Filtration System for Hot Gas Cleaning
开发用于热气体净化的高性能过滤系统
  • 批准号:
    08558064
  • 财政年份:
    1996
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)

相似海外基金

Experimental evaluation of aerosol particle deposition in the nasal region using a precision nasal model
使用精密鼻模型对鼻区气溶胶颗粒沉积进行实验评估
  • 批准号:
    23K11467
  • 财政年份:
    2023
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
A Foundational Step Towards the Development of a Predictive Framework for Particle Deposition in Wall-Bounded Turbulent Flows
开发壁面湍流中颗粒沉积预测框架的基础性步骤
  • 批准号:
    2219446
  • 财政年份:
    2022
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Standard Grant
Unravelling the mechanics of particle deposition at the micro-scale
揭示微观尺度颗粒沉积的机制
  • 批准号:
    DP220100764
  • 财政年份:
    2022
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Discovery Projects
Development of a new particle deposition coating process using flame aerosol technologies
使用火焰气溶胶技术开发新的颗粒沉积涂层工艺
  • 批准号:
    20J20823
  • 财政年份:
    2020
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for JSPS Fellows
Establishment of visible light responsive photocatalyst coating process by solid ceramic particle deposition
固体陶瓷颗粒沉积可见光响应光触媒涂层工艺的建立
  • 批准号:
    20K05152
  • 财政年份:
    2020
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Evaluation of the influence of charging state of atmospheric aerosol on particle deposition on human body and ground surface
大气气溶胶荷电状态对人体及地表颗粒沉积影响评价
  • 批准号:
    20H00636
  • 财政年份:
    2020
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Study of internal structure of hydrogen pellet ablation cloud and spatial distribution of particle deposition based on imaging spectroscopy
基于成像光谱的氢丸烧蚀云内部结构及颗粒沉积空间分布研究
  • 批准号:
    18K03588
  • 财政年份:
    2018
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Advances in particle deposition process based on verification of dynamic wetting
基于动态润湿验证的颗粒沉积过程进展
  • 批准号:
    18H01748
  • 财政年份:
    2018
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Fouling, particle deposition and presure drop during hydroprocessing
加氢处理过程中的结垢、颗粒沉积和压降
  • 批准号:
    514934-2017
  • 财政年份:
    2018
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Collaborative Research and Development Grants
Collaborative Research: Ultra Fine Particle Deposition onto Vegetated Surfaces Situated on Complex Topography: From Leaf to Landscape
合作研究:复杂地形上植被表面的超细颗粒沉积:从树叶到景观
  • 批准号:
    1644382
  • 财政年份:
    2017
  • 资助金额:
    $ 1.22万
  • 项目类别:
    Continuing Grant
{{ showInfoDetail.title }}

作者:{{ showInfoDetail.author }}

知道了