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Experimental Studies on Improvement of Surface Properties of Material By Pulsed -Ion-Beam Implantation

脉冲离子束注入改善材料表面性能的实验研究

基本信息

批准号：
63550065
负责人：
TAKAAI Tetsuya
金额：
$ 1.41万
依托单位：
Yamanashi University
依托单位国家：
日本
项目类别：
Grant-in-Aid for General Scientific Research (C)
财政年份：
1988
资助国家：
日本
起止时间：
1988 至 1989
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-63550065/
关键词：
Pulse Ion Beam Surface Layer of Titan B, N Ion Implantation X-ray Analysis ESCA Residual Stress Fusion and Vaporization Rapid Cooling 溶融蒸発大強度パルスイオンビーム発生装置金属チタン表面 B、Nイオン注入熱的残留応力格子定数

项目摘要

Conventional, steady-state charged ion beams have been successfully applied in the R and D of materials such as in semiconductor processing, welding, and lithography. On the other hand, intense pulsed light ion beam(LIB), which significantly differs from the conventional ion beams have been recently considered for various applications, particularly in material science. If the LIB is irradiated onto the materials, the surface will be quickly heated to produce high density plasma. In the present experiments, an intense pulsed light ion beam (LIB) applications in materials science have been experimentally studied, where the LIB is utilized as effective "heat" source.Sintered BN, or sintered apatite chips were used as an ion source.The obtained conclusions can be summarized as follows: (1) The Vicker's hardness increases almost linearly with increasing the number of shots of LIB. It increases by a factor of 60 % after the irradiation of 100 shots compared to that of no irradiation. (2) Clear evidences have been obtained on the formation of TiN, TiB and TiB_2 from the X-ray diffraction results after being implanted by the high energy LIB Into titanium. (3) Residual stress (tensile) generated in the ion implanted layer of Ti ranges from 200 -400 MPa. The tensile residual stress changes into the compressive stress by after being annealed in vacuum. (4) Apatite coating has been found on the surface of Ti by the irradiation of LIB by "Ion Beam Evaporation"(IBE). The film thickness prepared is estimated to be 6 - 10 mum. The film seems to be homogeneous.

传统的稳态带电离子束已经成功地应用于半导体加工、焊接和光刻等材料的研究和开发。另一方面，强脉冲光离子束（LIB），这显着不同于传统的离子束最近已被认为是各种应用，特别是在材料科学。如果LIB照射到材料上，表面将迅速加热以产生高密度等离子体。本文对强流脉冲光离子束（LIB）在材料科学中的应用进行了实验研究，其中LIB被用作有效的“热”源，烧结BN或烧结磷灰石碎片被用作离子源，所得到的结论可以概括如下：（1）维氏硬度随LIB发射次数的增加几乎呈线性增加;与未照射相比，照射100次后，其增加了60%。(2)从高能离子束注入钛后的X射线衍射结果中得到了TiN、TiB和TiB_2形成的明确证据。(3)在Ti的离子注入层中产生的残余应力（拉伸）范围为200 - 400 MPa。真空退火后，残余拉应力转变为压应力。(4)利用离子束蒸发技术对钛进行辐照，在钛表面形成了磷灰石涂层。所制备的膜厚度估计为6 - 10 μ m。这部电影似乎是同质的。