Photoelectrochemical Properties of TiO_2 Coatings by LPC Plasma Spraying
LPC等离子喷涂TiO_2涂层的光电化学性能
基本信息
- 批准号:63550548
- 负责人:
- 金额:$ 1.22万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for General Scientific Research (C)
- 财政年份:1988
- 资助国家:日本
- 起止时间:1988 至 1989
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Effects of spray conditions and heat-treatment on the photoelectrochemical behavior of TiO_2-oxide system coatings produced by plasma spraying were investigated.It is shown that the photocurrent of air plasma-sprayed coatings is larger than one of LPC plasma-sprayed coatings, and auxiliary gas, H_2, influences greatly the photoelectrolysis of TiO_2 and TiO_2-oxide mixture coatings.The photocurrent of TiO_2 plasma-sprayed coatings increases by adding various metal-oxides, such as Al_2O_3, Y_2O_3 etc, to TiO_2 coatings.The photoelectrochemical properties of TiO_2 and TiO_2-oxide system plasma-sprayed coatings are improved greatly by heat-treatment (400゚C,90min.) in air.The photocurrent of TiO_2 and TiO_2-oxides coatings that plasma- sprayed with plasma gas, Ar-H_2 and then heat-treated(400゚C,90 min.) in air, depend on the formation free energy of the additional oxide. And, photocurrents of such TiO_2-oxide mixture plasma- sprayed coatings increase with the decrease of the ionized donor density concentration, ND of TiO_2-oxide mixture photoanodes.It is concluded that polycrystalline TiO_2 coatings produced by the plasma-spraying display similar photoelectrochemical characteristics to single-crystal TiO_2 material.
研究了喷涂条件和热处理对等离子喷涂TiO_2-氧化物体系涂层光电化学行为的影响,结果表明,空气等离子喷涂涂层的光电流大于LPC等离子喷涂涂层的光电流,辅助气体H_2、TiO_2等离子体的光电流对TiO_2和TiO_2-氧化物混合膜的光电流有很大影响。在TiO_2涂层中添加Al_2O_3、Y_2O_3等金属氧化物,可提高涂层的光电性能,并对TiO_2及TiO_2-氧化物体系等离子喷涂涂层进行热处理(400 ℃,90 min),可显著提高涂层的光电性能。用等离子体气体Ar-H_2等离子喷涂TiO_2和TiO_2氧化物涂层,然后热处理(400 ℃,90 min),研究了涂层的光电流。在空气中,取决于附加氧化物的形成自由能。随着TiO_2-氧化物混合物光阳极电离施主浓度ND的降低,多晶TiO_2涂层的光电流增大,表明多晶TiO_2涂层具有与单晶TiO_2材料相似的光电化学特性。
项目成果
期刊论文数量(12)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Wolfgang W.Gatner: "Deplection-Layer Photoeffects in Semiconductors, Phys.Rev., 116-1, 84(1959)"
Wolfgang W.Gatner:“半导体中的耗尽层光效应,Phys.Rev., 116-1, 84(1959)”
- DOI:
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- 影响因子:0
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朴景采,大森明,荒田吉明: "プラズマ溶射によるTiO_2溶射皮膜電極形成の光電極特性に関する研究 各種処理条件に従う光電極特性の検討" 日本金属学会講演概要、一般講演. 第105. 602 (1989)
Kyung-chae Park、Akira Omori、Yoshiaki Arata:“通过等离子喷涂形成 TiO_2 喷涂膜电极的光电极性能研究。各种加工条件下光电极性能的检查”日本金属学会讲座摘要,一般讲座第 105 期。602。 (1989)
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Wang R. and Henager C.H.: "Arc-Plasma-Sprayed Rutile Anodes for Photoelectrolysis of Water" J.Electrochem.Soc.126. 83 (1979)
Wang R. 和 Henager C.H.:“用于水光电解的电弧等离子体喷涂金红石阳极”J.Electrochem.Soc.126。
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- 影响因子:0
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Parent L., Dodelet J.P., Ross G.G. and Terreault B.: "Plasma-Sprayed Semiconductor Electrodes:photoelectrochmical Properties of TiO_2, J.Electrochem.Soc., 132, 2590(1985)"
Parent L.、Dodelet J.P.、Ross G.G.
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Lindquist S.E., Finnstrom B. and Tefner: "Photoelectrochemical Prooerties of Polycrystalline TiO_2 Thin Film Electrodes on Quartz Substrates, J.Electrochem.Soc., 130, 351(1983)"
Lindquist S.E.、Finnstrom B. 和 Tefner:“石英基底上多晶 TiO_2 薄膜电极的光电化学特性,J.Electrochem.Soc., 130, 351(1983)”
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OHMORI Akira其他文献
OHMORI Akira的其他文献
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{{ truncateString('OHMORI Akira', 18)}}的其他基金
The investigation of the injection mechanism into the plastic substrate by applying thermal spray technique and it's compound surface treatment
热喷涂塑料基体注射机理及其复合表面处理研究
- 批准号:
11309008 - 财政年份:1999
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
LIQUID SINTERING OF PLASMA-SPRAYED ZIRCONIA COATING BY PENETRATION TREATMENT OF LIQUID MN AND MN-CU ALLOYS
液态锰和锰铜合金渗透处理等离子喷涂氧化锆涂层的液态烧结
- 批准号:
06453087 - 财政年份:1994
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$ 1.22万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
Development of Precise Evaluation Method for Ceramic Plasma Sprayed Coatings
陶瓷等离子喷涂层精密评价方法的开发
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59850124 - 财政年份:1984
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research
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