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Development of a System for Measurement of Properties of Flow is the CVD Apparatus Using LIF

开发使用 LIF 的 CVD 装置来测量流动特性的系统

基本信息

批准号：
02555039
负责人：
FUJIMOTO Tetsuo
金额：
$ 6.78万
依托单位：
Nagoya University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research (B)
财政年份：
1990
资助国家：
日本
起止时间：
1990 至 1991
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-02555039/
关键词：
LIF Iodine Molecule Temperature Measurement Two-dimensional Measurement Visualized Image High Sensitive CCD Camera Laser Sheet Picture Processing 高感度ビジコンカメラ

项目摘要

As a system for measurement of properties of flow in the CVD apparatus, a method for quantitative imaging of temperature in the rarefied gas flow has been developed. The flow field is visualized by planar laserinduced fluorescence (PLIF) of iodine molecules seeded in carrier gas. Iodine molecules have many absorption lines in visible region and radiate intense fluorescence. The fluorescence intensity is proportional to the number of molecules in the energy level excited by the laser beam. From the dependence of this number on the temperature, the local temperature can be decided from the ratio of the fluorescence intensities of two visualized images which are obtained by irradiations of laser beams with different wave length. This method allows to image the two-dimensional temperature distribution of the flow field by means of a laser sheet and a high sensitive CCD camera. This method is applied to the temperature measurement of the flow field of a supersonic free jet in which temperature varies drastically. It is found that the temperature distribution of the jet measured by P(16)/R(18)[514.720 nm] and P(26)/R(28)[514.942 mn] absorption lines in the transition of B(v'=43) X(v"=0) agrees well with the theoretical one.This system was applied to an interacting flow field between a supersonic free jet and a Si wafer. From the result, the propriety and the effectiveness of the system are verified.

本文提出了一种稀薄气体流动温度的定量成像方法，作为CVD装置中流动特性的测量系统。用平面激光诱导荧光（PLIF）观察了载气中碘分子的流场。碘分子在可见光区有多条吸收谱线，并发出强烈的荧光。荧光强度与激光束激发的能级上的分子数成正比。根据该数值与温度的关系，可以通过不同波长的激光束照射得到的两幅可视化图像的荧光强度之比来确定局部温度。该方法可以利用激光片和高灵敏度CCD相机对流场的二维温度分布进行成像。将该方法应用于温度剧烈变化的超声速自由射流流场的温度测量。用P(16)/R(18)[514.720 nm]和P(26)/R(28)[514.942 mn]吸收谱线在B(v'=43) X（v '= 0）跃迁过程中测得的射流温度分布与理论相符。将该系统应用于超声速自由射流与硅片的相互作用流场。从结果上验证了该系统的合理性和有效性。