Study on High Efficient and High Precision Mirror Finishing of Fine Ceramics by Magnetic Abrasive Machining Process
Study on High Efficient and High Precision Mirror Finishing of Fine Ceramics by Magnetic Abrasive Machining Process
批准号:
02650084
负责人:
SHINMURA Takeo
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1990
资助国家:
日本
项目状态:
已结题
起止时间:
1990 至 1992
中文摘要
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英文摘要
The results obtained in this investigation are as follows: (1) Diamond magnetic abrasives are newly made to finish fine ceramics by electroplating process and electroless plating process respectively. (2) The finishing performances of these new magnetic abrasives are examined for plane finishing. (3) The diamond magnetic abrasives made by electroless plating process was same grade in the finishing performance compared with the ones made by electroplating process. (4) The effects of diamond particle size, iron particle size and shape, finishing pass number on stock removal and surface roughness are examined experimentally, and the finishing mechanism is discussed. (5) A new diamond magnetic abrasives was made by chemical adhesion process and its finishing performance was also examined. (6) New efficient magnetic abrasive finishing is created in which the new type magnetic abrasives are used mixing small sized diamond magnetic abrasives with such large sized ferromagnetic particles as iron particles. (7) It was pointed out that the machining efficiency was influenced severely by both the iron particle diameter and the mixing weight percentage of iron particles, and there was suitable value for the mixing weight percentage. (8) Discussing this finishing mechanism theoretically, it was clarified that the machining efficiency were improved remarkably based on the increasing effects of both the finishing pressure and the magnetic brush rigidity. (9) Using Cr_2O_3-Fe simply mixing type magnetic abrasives in the plane finishing, Si_3N_4 fine ceramic plate was able to be finished, and using SiO_2-Fe simply mixing type magnetic abrasives, Al_2O_3 fine ceramic plate was also finished. (10) At present, the author is studing on the new magnetic field assisted finishing processes of ceramic balls and rollers in co-operation with Prof. R. Komanduri, Oklahoma State University in USA.
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進村 武男: "磁気研磨法による内面の平滑加工に関する研究" 日本機械学会論文集(C編). 59. (1993)
Takeo Shinmura:“磁力抛光法内部平滑的研究”,日本机械工程学会会刊(编辑 C)59。(1993 年)。
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進村 武男: "磁気研磨法に関する研究-混合磁性砥粒を用いたガらすの研磨-" 日本機械学会第70期全国大会講演論文集(Vol.E). 402-404 (1992)
Takeo Shinmura:“磁性抛光方法的研究 - 使用混合磁性磨粒抛光玻璃”第 70 届日本机械工程学会全国会议论文集(Vol.E)402-404(1992 年)。
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Takeo SHINMURA: Fuji-Techno system Co.[Magnetic Abrasive Finishing], (1994)
Takeo SHINMURA:Fuji-Techno system Co.[磁力研磨加工],(1994)
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進村 武男: "平面磁気研磨法の研究" 日本機械学会東北支部第26期聡会・講演会講演論文集,講演番号 308. (1991)
新村武雄:《平面磁力研磨法的研究》第26次中本会议论文集暨日本机械学会东北分会演讲会第308号演讲。(1991年)
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進村 武男: "磁気研磨法によるファインセラミックスの平滑加工に関する研究(第1報)ーダイヤモンド磁性砥粒の開発とその研磨性能" 精密工学会誌. 6
新村武雄:“利用磁力抛光法进行精细陶瓷的平滑化研究(第1部分)——金刚石磁性磨粒的开发及其抛光性能”,日本精密工程学会杂志第6期。
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共 41 条
Development of a new mirror finishing process for the inner surface of capillary tube of 50〜100 micrometers in diameter by the application of magnetic field assisted machining
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批准号:16360062
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.19万
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财政年份:2004
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负责人:SHINMURA Takeo
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依托单位:
Development of a New Ultra-precision Finishing Process Applying the Cavitation Phenomena in Ultrasonic Vibration
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批准号:11650116
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.05万
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财政年份:1999
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负责人:SHINMURA Takeo
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依托单位:
Development of High Precision Finishing Process for Micro-machine Elements by the Application of Magnetic Abrasive Machining
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批准号:08650127
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.34万
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财政年份:1996
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负责人:SHINMURA Takeo
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依托单位:
Development of a New Ultra-precision Finishing Process for Internal Surface by the Application of Magnetic Abrasive Machining Using Superconducting Coil
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批准号:06555032
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$8.13万
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财政年份:1994
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负责人:SHINMURA Takeo
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依托单位:
Study on Free Form Surface Finishing by Magnetic Abrasive Machining Process
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批准号:63550096
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.22万
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财政年份:1988
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负责人:SHINMURA Takeo
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依托单位:
海外基金