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Characterization of Alumina Surface Contaminated Sulfur Compounds Studied by Tunneling Spectroscopy

通过隧道光谱研究氧化铝表面污染的硫化合物的表征

基本信息

批准号：
02650545
负责人：
KAMATA Satsuo
金额：
$ 1.22万
依托单位：
Kagoshima University
依托单位国家：
日本
项目类别：
Grant-in-Aid for General Scientific Research (C)
财政年份：
1990
资助国家：
日本
起止时间：
1990 至 1991
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-02650545/
关键词：
Inelastic electron tunneling spectroscopy Vibration spectra Surface analysis Alumina Surface Organic sulfur compounds Iron surface Organic phosphorous compounds Esters 金属酸化物アルミナ

项目摘要

Analyses of alumina surfaces were investigated by inelastic electron tunneling spectroscopy. The tunneling spectra of adsorbed species for organic thioacids, thioureas, thioamides and esters onto the alumina, and of coated silicon or metal film were measured by using Al/alumina(sample or film)/Pb tunneling junction. The following results were obtained from the analysis of vibration spectra.(1)On the clean alumina surfaces, there were many OH-groups, both free and hydrogen bonded, and a few aluminum cations, i. e., Lewis' acid points.(2)Methane and benzen sulfonic acids were adsorbed as sulfonic ions onto alumina surfaces by reaction with surface OH groups. Thioureas and thioamides were found to be adsorbed on the surface by the interaction between the nitrogen atoms of these molecules and Al^+.(3)The analysis of vibration spectra for alkyl benzensulfonates and alkyl phosphites indicated that these esters were decomposed by their reaction with OH groups producing sulfonate and phosphonate ions on aluminum ion, perpendicularly. On the other hand, alkyl carboxylates were found to have two decomposition processes. One is the severing of the bond between the alkyl group and oxygen in the ester molecule, producing alkoxide ions which were adsorbed on the alumina surface. The other is the severing of the bond between the alkyl group and oxygen in the esters ; the carboxylate ions produced were adsorbed on the surface.(4)The evaporated silicon thin film on alumina was found to form many SiH_X on the surface. Inelastic electron tunneling spectra for copper or iron thin films on alumina showed that no signals were observed due to the copper or iron metals. This is interesting phenomena in the analysis of adsorbed compounds onto metal surfaces.

采用非弹性电子隧道能谱法对氧化铝表面进行了分析。采用Al/氧化铝（样品或薄膜）/Pb隧道结，测量了有机硫酸、硫脲、硫酰胺和酯类吸附物质在氧化铝上和涂覆硅或金属薄膜上的隧道光谱。通过对振动谱的分析，得到了以下结果：(1)在清洁的氧化铝表面，存在大量的oh -基团，既有自由的，也有氢键的，还有少量的铝阳离子，即路易斯酸点。(2)甲烷和苯磺酸通过与表面OH基团的反应，以磺酸离子的形式吸附在氧化铝表面。硫脲类和硫酰胺类分子通过氮原子与Al^+的相互作用被吸附在表面。(3)对烷基苯磺酸盐和烷基亚磷酸酯的振动谱分析表明，这两种酯与OH基团在铝离子上垂直反应生成磺酸盐和膦酸盐离子。另一方面，烷基羧酸酯被发现有两个分解过程。一是切断酯分子中烷基与氧之间的键，产生醇氧离子，并吸附在氧化铝表面。二是酯中烷基与氧之间的键被切断；所产生的羧酸离子被吸附在表面。(4)氧化铝上蒸发的硅薄膜在表面形成了大量的SiH_X。氧化铝上的铜或铁薄膜的非弹性电子隧穿光谱表明，由于铜或铁金属，没有观察到信号。在分析金属表面吸附的化合物时，这是一个有趣的现象。